Akio Misaka
at Osaka Metropolitan Univ
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 28 July 2014 Paper
Proceedings Volume 9256, 92560A (2014) https://doi.org/10.1117/12.2065251
KEYWORDS: Photomasks, Lithography, Transmittance, Resolution enhancement technologies, Binary data, Geometrical optics, Numerical simulations, Light wave propagation, Collimation, Phase shifts

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90520I (2014) https://doi.org/10.1117/12.2046060
KEYWORDS: Photomasks, Lithography, Transmittance, Resolution enhancement technologies, Binary data, Geometrical optics, Optical lithography, Phase shifts, Light wave propagation, Collimation

Proceedings Article | 23 March 2011 Paper
Takashi Matsuda, Shigeo Irie, Tadami Shimizu, Takashi Yuito, Yasuko Tabata, Yuuji Nonami, Akio Misaka, Taichi Koizumi, Masaru Sasago
Proceedings Volume 7973, 797316 (2011) https://doi.org/10.1117/12.878727
KEYWORDS: Photomasks, Source mask optimization, Binary data, Halftones, Logic devices, Lithographic illumination, Phase shifts, Resolution enhancement technologies, Logic, Optical proximity correction

Proceedings Article | 13 March 2010 Paper
Takashi Yuito, Hiroshi Sakaue, Takashi Matsuda, Tadami Shimizu, Shigeo Irie, Fumio Iwamoto, Akio Misaka, Taichi Koizumi, Masaru Sasago
Proceedings Volume 7640, 76401B (2010) https://doi.org/10.1117/12.848025
KEYWORDS: Photomasks, Printing, Lithography, Image enhancement, Logic, Transmittance, Lab on a chip, Resolution enhancement technologies, Immersion lithography, Phase shifts

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598977
KEYWORDS: Thin films, Photomasks, Transmittance, Printing, Lithography, Halftones, Semiconducting wafers, Critical dimension metrology, Quartz, Resolution enhancement technologies

Showing 5 of 11 publications
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