Design for manufacture to deal with mask-induced critical dimension errors in the extreme ultraviolet

Yumi Nakajima; Takashi Sato; Ryoichi Inanami; Tetsuro Nakasugi; Tatsuhiko Higashiki

doi:10.1117/1.3421948

1 April 2010 Design for manufacture to deal with mask-induced critical dimension errors in the extreme ultraviolet

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 9, Issue 2, 023009 (April 2010). https://doi.org/10.1117/1.3421948

Abstract

The actual extreme ultraviolet lithography tools will have aberrations around seven times larger than those of the latest ArF lithography tools in wavelength normalized rms. We calculated the influence of aberrations on the size error and pattern shift error using Zernike sensitivity analysis. Mask-induced aberration restricts the specification of aberration. Without periodic additional pattern, the aberration level that can be accepted to form 22 nm dual-gate patterns was <8 mλ rms. Arranging the periodic additional pattern relaxed the aberration tolerance. With periodic additional pattern, the acceptable aberration level to form 22 nm patterns was below <37 mλ rms. It is important to make pattern periodicity for the relaxation of the aberration specification.

©(2010) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, and Tatsuhiko Higashiki "Design for manufacture to deal with mask-induced critical dimension errors in the extreme ultraviolet," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(2), 023009 (1 April 2010). https://doi.org/10.1117/1.3421948

Published: 1 April 2010

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available