Dr. Ryoichi Inanami Profile

Dr. Ryoichi Inanami

at KIOXIA Corp

SPIE Involvement:

Author

Publications (20)

SPIE Journal Paper | 16 December 2021

Multi-field imprint technology: enabling the productivity enhancement of nano-imprint lithography

Tetsuro Nakasugi, Kazuya Fukuhara, Motofumi Komori, Soichi Inoue, Koji Hashimoto, Ryoichi Inanami

JM3, Vol. 21, Issue 01, 011002, (December 2021) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.011002

KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Optical alignment, Lithography, Distortion, Optical lithography, Overlay metrology, Head, Photomasks, Error analysis

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Proceedings Article | 22 February 2021 Presentation + Paper

Multi-field imprint technology: enabling the productivity enhancement of NIL

Tetsuro Nakasugi, Ryoichi Inanami, Kazuya Fukuhara, Motofumi Komori, Sadanori Arae, Soichi Inoue, Koji Hashimoto

Proceedings Volume 11610, 1161008 (2021) https://doi.org/10.1117/12.2583385

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Proceedings Article | 31 March 2017 Paper

RLT uniformity improvement utilizing multi-scale NIL process simulation

Sachiko Kobayashi, Ryoichi Inanami, Hirotaka Tsuda, Kazuhiro Washida, Motofumi Komori, Kyoji Yamashita, Ji-Young Im, Takuya Kono, Shimon Maeda

Proceedings Volume 10144, 101440X (2017) https://doi.org/10.1117/12.2258172

KEYWORDS: Nanoimprint lithography, Photoresist processing, Design for manufacturability, Nanolithography, Optical lithography, Ultraviolet radiation, Scatter measurement, UV optics, Lithography, Double patterning technology, Design for manufacturing, Optical microscopes, Nanotechnology, Artificial intelligence

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Proceedings Article | 22 March 2016 Paper

Design for nanoimprint lithography: total layout refinement utilizing NIL process simulation

Sachiko Kobayashi, Motofumi Komori, Inanami Ryoichi, Kyoji Yamashita, Akiko Mimotogi, Ji-Young Im, Masayuki Hatano, Takuya Kono, Shimon Maeda

Proceedings Volume 9777, 977708 (2016) https://doi.org/10.1117/12.2219052

KEYWORDS: Nanoimprint lithography, Lithography, Design for manufacturing, Photoresist processing, Computer simulations, Computational lithography, Design for manufacturability, Nanolithography, Optical lithography, Ultraviolet radiation, Double patterning technology, Calibration, Semiconductors, Optics manufacturing

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Proceedings Article | 28 March 2014 Paper

The prospects of design for roll to roll lithography: layout refinement utilizing process simulation

Sachiko Kobayashi, Mitsuko Shimizu, Satoshi Tanaka, Yohko Furutono, Masayuki Hatano, Kazuto Matsuki, Ryoichi Inanami, Shoji Mimotogi

Proceedings Volume 9049, 904911 (2014) https://doi.org/10.1117/12.2046771

KEYWORDS: Design for manufacturing, Ultraviolet radiation, Lithography, Optical lithography, Photoresist processing, Semiconductors, Computational lithography, Manufacturing, Source mask optimization, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Challenges for pattern formation with sub-100nm residual-layer thickness by roll-to-roll nanoimprint lithography

Ryoichi Inanami, Kazuto Matsuki, Tomoko Ojima, Takuya Kono, Tetsuro Nakasugi

Proceedings Volume 9049, 90490I (2014) https://doi.org/10.1117/12.2046248

KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Positron emission tomography, Coating, Diffractive optical elements, Electrodes, Lithography, Semiconductors, Photography, Silicon films

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Proceedings Article | 21 March 2012 Paper

Sub-100 nm pattern formation by roll-to-roll nanoimprint

Ryoichi Inanami, Tomoko Ojima, Kazuto Matsuki, Takuya Kono, Tetsuro Nakasugi

Proceedings Volume 8323, 83231J (2012) https://doi.org/10.1117/12.916584

KEYWORDS: Optical lithography, Nickel, Silicon, Semiconducting wafers, Positron emission tomography, Atomic force microscopy, Scanning electron microscopy, Ultraviolet radiation, Nanoimprint lithography, Lithography

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SPIE Journal Paper | 1 April 2010

Design for manufacture to deal with mask-induced critical dimension errors in the extreme ultraviolet

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

JM3, Vol. 9, Issue 02, 023009, (April 2010) https://doi.org/10.1117/12.10.1117/1.3421948

KEYWORDS: Diffraction, Tolerancing, Critical dimension metrology, Design for manufacturability, Manufacturing, Error analysis, Extreme ultraviolet lithography, Polarization, Extreme ultraviolet, Lithography

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Proceedings Article | 23 March 2010 Paper

Process liability evaluation for beyond 22nm node using EUVL

Kazuo Tawarayama, Hajime Aoyama, Kentaro Matsunaga, Yukiyasu Arisawa, Taiga Uno, Shunko Magoshi, Suigen Kyoh, Yumi Nakajima, Ryoichi Inanami, Satoshi Tanaka, Ayumi Kobiki, Yukiko Kikuchi, Daisuke Kawamura, Kosuke Takai, Koji Murano, Yumi Hayashi, Ichiro Mori

Proceedings Volume 7636, 76361O (2010) https://doi.org/10.1117/12.846265

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Manufacturing, Lithography, Etching, Extreme ultraviolet, Photoresist processing, Reactive ion etching, Silica, Metals

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Proceedings Article | 20 March 2010 Paper

Study of practical TAT reduction approaches for EUV flare correction

Ryoichi Inanami, Hiromitsu Mashita, Takamasa Takaki, Toshiya Kotani, Suigen Kyoh, Satoshi Tanaka

Proceedings Volume 7636, 763616 (2010) https://doi.org/10.1117/12.846326

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Point spread functions, Scattering, Critical dimension metrology, Convolution, Extreme ultraviolet, Optical proximity correction, Lithography

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SPIE Journal Paper | 1 October 2009

Process liability evaluation for extreme ultraviolet lithography

Hajime Aoyama, Kazuo Tawarayama, Yuusuke Tanaka, Daisuke Kawamura, Yukiyasu Arisawa, Taiga Uno, Takashi Kamo, Toshihiko Tanaka, Toshiro Itani, Hiroyuki Tanaka, Yumi Nakajima, Ryoichi Inanami, Kosuke Takai, Koji Murano, Takeshi Koshiba, Kohji Hashimoto, Ichiro Mori

JM3, Vol. 8, Issue 04, 041508, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238542

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Point spread functions, Semiconducting wafers, Lithography, Photoresist processing, Semiconductors, Projection systems, Tungsten

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Proceedings Article | 11 May 2009 Paper

Mask-induced aberration in EUV lithography

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7379, 73790P (2009) https://doi.org/10.1117/12.824266

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Diffraction, Extreme ultraviolet, Lithographic illumination, Polarization, Manufacturing, Tolerancing, Lithography, Critical dimension metrology

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Proceedings Article | 18 March 2009 Paper

Process liability evaluation for EUVL

Proceedings Volume 7271, 727120 (2009) https://doi.org/10.1117/12.813484

KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet lithography, Point spread functions, Semiconducting wafers, Logic, Lithography, Electronic design automation, Projection systems, Mask making

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Proceedings Article | 20 March 2008 Paper

Aberration budget in extreme ultraviolet lithography

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 6921, 69211A (2008) https://doi.org/10.1117/12.771602

KEYWORDS: Tolerancing, Diffraction, Extreme ultraviolet lithography, Error analysis, Lithography, Phase shifts, Polarization, Manufacturing, Photomasks, Extreme ultraviolet

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Proceedings Article | 16 March 2007 Paper

Exposure characteristics of character projection-type low-energy electron-beam direct writing system

Takayuki Satoh, Ryoichi Inanami, Katsumi Kishimoto, Keizo Hirose, Tetsuro Nakasugi, Takeshi Koshiba, Takumi Ota

Proceedings Volume 6517, 65172G (2007) https://doi.org/10.1117/12.711229

KEYWORDS: Electron beam direct write lithography, Line width roughness, Electron beams, Silicon, Data conversion, Beam shaping, Vestigial sideband modulation, Photoresist processing, System integration, Logic devices

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Proceedings Article | 24 March 2006 Paper

Data conversion system for character projection-type low-energy electron beam direct writing system

Ryoichi Inanami, Katsumi Kishimoto, Kazuhiro Nakai, Yoshikazu Ichioka, Kiyoshi Kitamura, Ryo Yamada, Shunko Magoshi

Proceedings Volume 6151, 615126 (2006) https://doi.org/10.1117/12.655438

KEYWORDS: Vestigial sideband modulation, Data conversion, Metals, Electron beams, Databases, Front end of line, Back end of line, Electron beam direct write lithography, Lithography, Logic devices

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Proceedings Article | 23 March 2006 Paper

Technology mapping technique for throughput enhancement of character projection equipment

Makoto Sugihara, Taiga Takata, Kenta Nakamura, Ryoichi Inanami, Hiroaki Hayashi, Katsumi Kishimoto, Tetsuya Hasebe, Yukihiro Kawano, Yusuke Matsunaga, Kazuaki Murakami, Katsuya Okumura

Proceedings Volume 6151, 61510Z (2006) https://doi.org/10.1117/12.656153

KEYWORDS: Photomasks, Logic, Vestigial sideband modulation, Electron beams, Laser induced breakdown spectroscopy, Software development, Maskless lithography, Semiconducting wafers, Manufacturing, Lithography

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Proceedings Article | 16 June 2003 Paper

Maskless lithography: estimation of the number of shots for each layer in a logic device with character-projection-type low-energy electron-beam direct writing system

Ryoichi Inanami, Shunko Magoshi, Shouhei Kousai, Atsushi Ando, Tetsuro Nakasugi, Ichiro Mori, Kazuyoshi Sugihara, Akira Miura

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483702

KEYWORDS: Back end of line, Vestigial sideband modulation, Logic devices, Metals, Data processing, Photomasks, Electron beams, Electron beam direct write lithography, Computer aided design, Beam shaping

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Proceedings Article | 16 June 2003 Paper

Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture, and recent progress

Tetsuro Nakasugi, Atsushi Ando, Ryoichi Inanami, Noriaki Sasaki, Takumi Ota, Osamu Nagano, Yuuichiro Yamazaki, Kazuyoshi Sugihara, Ichiro Mori, Motosuke Miyoshi, Katsuya Okumura, Akira Miura

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483607

KEYWORDS: Scanning electron microscopy, Virtual colonoscopy, System on a chip, Logic devices, Maskless lithography, Lenses, Semiconducting wafers, Inspection, Electron beam direct write lithography, Lithography

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Proceedings Article | 16 May 1994 Paper

Synthesis and patterning of 2-10 nanometer pinhole-free organic films

Sucheta Gorwadkar, G. Vinogradov, K. Senda, Ryoichi Inanami, C. Shao, Shinzo Morita

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175397

KEYWORDS: Atomic force microscopy, Thin films, Plasma, Optical lithography, Polymerization, Silicon, Surface roughness, Polymer thin films, Natural surfaces, Argon

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Showing 5 of 20 publications

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