Optical-electric thin films produced by low voltage reactive plasma-assisted deposition

Xu Liu; Bin Wang; Peifu Gu; Jinfa Tang

doi:10.1117/12.192171

4 November 1994 Optical-electric thin films produced by low-voltage reactive plasma assisted deposition

Xu Liu, Bin Wang, Peifu Gu, Jinfa Tang

Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192171
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France

Abstract

Low voltage reactive plasma assisted deposition (RPAD) is used here, to deposit the optical- electric films, such as transparent conductive thin films and Si₃N₄ films. Comparing to other thermal evaporation techniques, RPAD can produce more easily such kind of opto- electric thin films. Experimental results of the films deposited will be presented in this paper.

Citation Download Citation

Xu Liu, Bin Wang, Peifu Gu, and Jinfa Tang "Optical-electric thin films produced by low-voltage reactive plasma assisted deposition", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192171

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