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15 September 2022 Enhancement of the proximity and aerial imaging performance of a software-based data path for raster-scanned multi-beam laser writer
Hsiang Jen Yang, Po Sheng Wang, Chun Chieh Han, Yi Min Lin, Wen Wei Lee, Wei Shen Chen
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Proceedings Volume 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; 123250T (2022) https://doi.org/10.1117/12.2640527
Event: Photomask Japan 2022, 2022, Online Only
Abstract
Deep-ultraviolet (DUV) laser writer ALTA4700DP upgraded from ALTA4700. The new design laser mask pattern generator (LMPGs), advance electronic design automation (EDA), and multi-core CPU server (up to hundreds of core) are all constructed on the machine. The effective of machine (exposure time) and CD performance (uniformity, thr-pitch and corner rounding) of products are obvious reduced and improved, respectively. In research, not only the CD performance of mask was obtained by CD-SEM but also the CD performance of wafer was defined by AIMS simulation. The effect of corner rounding was proved by average CD and exposure intensity of contact structure by both CD-SEM measurement and AIMS simulation.
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Hsiang Jen Yang, Po Sheng Wang, Chun Chieh Han, Yi Min Lin, Wen Wei Lee, and Wei Shen Chen "Enhancement of the proximity and aerial imaging performance of a software-based data path for raster-scanned multi-beam laser writer", Proc. SPIE 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250T (15 September 2022); https://doi.org/10.1117/12.2640527
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KEYWORDS
Photomasks
Raster graphics
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