Characterization and imaging of nanostructured materials using tabletop extreme ultraviolet light sources

Robert Karl Jr.; Joshua Knobloch; Travis Frazer; Michael Tanksalvala; Christina Porter; Charles Bevis; Weilun Chao; Begoña Abad Mayor; Daniel Adams; Giulia F. Mancini; Jorge N. Hernandez-Charpak; Henry Kapteyn; Margaret Murnane

doi:10.1117/12.2297223

13 March 2018 Characterization and imaging of nanostructured materials using tabletop extreme ultraviolet light sources

Robert Karl Jr., Joshua Knobloch, Travis Frazer, Michael Tanksalvala, Christina Porter, Charles Bevis, Weilun Chao, Begoña Abad Mayor, Daniel Adams, Giulia F. Mancini, Jorge N. Hernandez-Charpak, Henry Kapteyn, Margaret Murnane

Author Affiliations +

Proceedings Volume 10585, Metrology, Inspection, and Process Control for Microlithography XXXII; 105850N (2018) https://doi.org/10.1117/12.2297223
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Using a tabletop coherent extreme ultraviolet source, we extend current nanoscale metrology capabilities with applications spanning from new models of nanoscale transport and materials, to nanoscale device fabrication. We measure the ultrafast dynamics of acoustic waves in materials; by analyzing the material’s response, we can extract elastic properties of films as thin as 11nm. We extend this capability to a spatially resolved imaging modality by using coherent diffractive imaging to image the acoustic waves in nanostructures as they propagate. This will allow for spatially resolved characterization of the elastic properties of non-isotropic materials.

Conference Presentation

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Robert Karl Jr., Joshua Knobloch, Travis Frazer, Michael Tanksalvala, Christina Porter, Charles Bevis, Weilun Chao, Begoña Abad Mayor, Daniel Adams, Giulia F. Mancini, Jorge N. Hernandez-Charpak, Henry Kapteyn, and Margaret Murnane "Characterization and imaging of nanostructured materials using tabletop extreme ultraviolet light sources", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105850N (13 March 2018); https://doi.org/10.1117/12.2297223

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