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Yagnesh Vaderiya
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Publications (1)
Proceedings Article | 28 March 2017 Paper
A novel approach of ensuring layout regularity correct by construction in advanced technologies
Shafquat Jahan Ahmed, Yagnesh Vaderiya, Radhika Gupta, Chittoor Parthasarathy, Jean-Claude Marin, Frederic Robert
Proceedings Volume 10148, 1014816 (2017) https://doi.org/10.1117/12.2257552
KEYWORDS: Metals, SRAF, Image compression, Critical dimension metrology, Double patterning technology, Manufacturing, Design for manufacturing, Silicon, Design for manufacturability, Optical proximity correction, Yield improvement
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