CONFERENCE PROCEEDINGS
Advanced Search
Andrew Moe
at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 11 April 2017 Presentation + Paper
Process margin improvement through finger-print removal based on scanner leveling data
Young Jun Kim, Tony Park, Jeong Heung Kong, Dong Kyung Han, Jin Phil Choi, Young Seog Kang, Se Yeon Jang, Jeroen Cottaar, Jan-Pieter van Delft, Jeroen Rutten, Axel von Sydow, Marcel Bontekoe, Maarten Boogaarts, Arjan Donkerbroek, Ruiyue Ouyang, Balaji Rangarajan, Khalid Elbattay, Andrew Moe, Chung-Yong Kim
Proceedings Volume 10147, 1014709 (2017) https://doi.org/10.1117/12.2258184
KEYWORDS: Manufacturing
Proceedings Article | 24 March 2017 Presentation + Paper
Scanner-to-scanner CD analysis and control in an HVM environment
Du Hyun Beak, Ju Hee Shin, Tony Park, Dong Kyeng Han, Jin Phil Choi, Jeong Heung Kong, Young Seog Kang, Se Yeon Jang, Peter Nikolsky, Chris Strolenberg, Noh-Kyoung Park, Khalid Elbattay, Vito Tomasello, Austin Peng, Anand Guntuka, Zhao-Ze Li, Ronald Goossens, Machi Ryu, Jangho Shin, Chung-Yong Kim, Andrew Moe, Yun-A Sung
Proceedings Volume 10147, 101470A (2017) https://doi.org/10.1117/12.2258339
KEYWORDS: Critical dimension metrology, Scanners, Lithographic illumination, Image processing, Process control, Computational lithography, Semiconducting wafers, Data modeling, Metrology, Photomasks, Calibration, Finite element methods, Laser scanners, 3D scanning
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top