Dr. Zheng Cui Profile

Dr. Zheng Cui

Senior Scientist at Science and Technology Facilities Council

SPIE Involvement:

Author

Publications (38)

Proceedings Article | 28 November 2007 Paper

Rapid nanofabrication with high density pattern with UVN30 chemically amplified resist

Xudi Wang, Yifang Chen, Zheng Cui, Shaojun Fu

Proceedings Volume 6724, 67240A (2007) https://doi.org/10.1117/12.782497

KEYWORDS: Electron beam lithography, Silicon, Etching, Deep reactive ion etching, Photoresist processing, Nanolithography, Reactive ion etching, Photomasks, Chemically amplified resists, Standards development

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SPIE Journal Paper | 1 January 2006

Study of pattern placement error by thermal expansions in nanoimprint lithography

Yifang Chen, Jiarui Tao, Xing-Zhong Zhao, Zheng Cui

JM3, Vol. 5, Issue 01, 011002, (January 2006) https://doi.org/10.1117/12.10.1117/1.2172991

KEYWORDS: Nanoimprint lithography, Silicon, Gallium arsenide, Polymethylmethacrylate, Lithography, Etching, Electron beam lithography, Scanning electron microscopy, Distortion, Dry etching

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Proceedings Article | 28 September 2005 Paper

Nanoimprint and soft lithography for planar photonic meta-materials

Yifang Chen, J% Tao, Xingzhong Zhao, Zheng Cui, Alexander Schwanecke, Nikolay Zheludev

Proceedings Volume 5955, 59550C (2005) https://doi.org/10.1117/12.620446

KEYWORDS: Nanoimprint lithography, Dielectrics, Lithography, Metamaterials, Silicon, Electron beam lithography, Manufacturing, Dielectric polarization, Etching, Optics manufacturing

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Proceedings Article | 30 December 2004 Paper

Development of microfabrication technology for MEMS/MOEMS applications

Zheng Cui

Proceedings Volume 5641, (2004) https://doi.org/10.1117/12.581272

KEYWORDS: Silicon, Microelectromechanical systems, Polymers, Microopto electromechanical systems, Etching, Microsystems, Manufacturing, Micromachining, Microfabrication, Metals

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Proceedings Article | 25 March 2003 Paper

One-step lithography for fabrication of a hybrid microlens array using a coding gray-level mask

Jun Yao, Deepak Uttamchandani, Yixiao Zhang, Yongkang Guo, Zheng Cui

Proceedings Volume 4945, (2003) https://doi.org/10.1117/12.468419

KEYWORDS: Microlens, Photomasks, Photoresist materials, Optical components, Microlens array, Lithography, Chromatic aberrations, OSLO, Optical design, Photoresist developing

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SPIE Journal Paper | 1 February 2003

Real-time photolithographic technique for fabrication of arbitrarily shaped microstructures

Qinjun Peng, Shijie Liu, Yongkang Guo, Bo Chen, Jinglei Du, Yangsu Zeng, Chongxi Zhou, Zheng Cui

OE, Vol. 42, Issue 02, (February 2003) https://doi.org/10.1117/12.10.1117/1.1531976

KEYWORDS: LCDs, Optical lithography, Axicons, Photomasks, Etching, Photoresist materials, Fabrication, Lithography, Computer simulations, Light sources

Proceedings Article | 17 January 2003 Paper

Overview of grey-scale photolithography for micro-optical elements fabrication

Zheng Cui, Jinglei Du, Yongkang Guo

Proceedings Volume 4984, (2003) https://doi.org/10.1117/12.477831

KEYWORDS: Photomasks, Optical lithography, Microlens, Electron beam lithography, Optical components, Modulation, Photoresist materials, LCDs, Glasses, Etching

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Proceedings Article | 13 November 2002 Paper

An integrated biochip design and fabrication

Zhan Zhao, Dafu Cui, Shanhong Xia, Zheng Cui

Proceedings Volume 4936, (2002) https://doi.org/10.1117/12.469426

KEYWORDS: Electrodes, Sensors, Glasses, Photoresist materials, Capillaries, Temperature sensors, Microfluidics, Gold, Polymers, Analytical research

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Proceedings Article | 3 June 2002 Paper

Fabrication of beam sampling grating with electron-beam direct writing

Fuhua Gao, Yangsu Zeng, Shiwei Xie, Feng Gao, Jun Yao, Yongkang Guo, Jinglei Du, Zheng Cui

Proceedings Volume 4659, (2002) https://doi.org/10.1117/12.469296

KEYWORDS: Chemical elements, Diffraction, Binary data, Zone plates, Holography, Manufacturing, Laser systems engineering, Diffraction gratings, Diffractive optical elements, Laser energy

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Proceedings Article | 19 April 2002 Paper

Fractional Fourier domain filtering applied to improve image quality in photolithography

Yixiao Zhang, Jinglei Du, Jingguo Yang, Yangsu Zeng, Yongkang Guo, Zheng Cui, Jun Yao

Proceedings Volume 4755, (2002) https://doi.org/10.1117/12.462880

KEYWORDS: Image filtering, Optical lithography, Image quality, Image resolution, Fourier transforms, Fractional fourier transform, Image processing, Imaging systems, Image enhancement, Optical filters

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Proceedings Article | 19 April 2002 Paper

Design and experiment of silicon PCR chips

Zheng Cui, Zhan Zhao, Shanhong Xia

Proceedings Volume 4755, (2002) https://doi.org/10.1117/12.462884

KEYWORDS: Silicon, Liquids, Platinum, Semiconducting wafers, Failure analysis, Stress analysis, Structural design, Silicon films, Sensors, Polymers

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Proceedings Article | 19 April 2002 Paper

LCD real-time mask technique for fabrication of arbitrarily shaped microstructure

Qinjun Peng, Yongkang Guo, Bo Chen, Jinglei Du, Jinshan Xiang, Zheng Cui

Proceedings Volume 4755, (2002) https://doi.org/10.1117/12.462879

KEYWORDS: LCDs, Photomasks, Axicons, Optical lithography, Etching, Photoresist materials, Fabrication, Glasses, Electrodes, Lithography

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Proceedings Article | 14 September 2001 Paper

FEA modeling of a thermally excited silicon-beam resonant pressure sensor

Deyong Chen, Dafu Cui, Li Wang, Zhongyao Yu, Zheng Cui, Shanhong Xia

Proceedings Volume 4414, (2001) https://doi.org/10.1117/12.440192

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Proceedings Article | 14 September 2001 Paper

Simulation of optical lithography from distorted photomasks

Zheng Cui, Jinglei Du, Yangsu Zheng, Yongkang Guo

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435689

KEYWORDS: Photomasks, Optical simulations, Optical lithography, Electron beam lithography, Distortion, Photoresist materials, Monte Carlo methods, 3D image processing, Lithography, Image processing

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Proceedings Article | 14 September 2001 Paper

Heat properties of an integrated micro PCR vessel

Zhan Zhao, Dafu Cui, Zhongyao Yu, Li Wang, Shanhong Xia, Zheng Cui

Proceedings Volume 4414, (2001) https://doi.org/10.1117/12.440202

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SPIE Journal Paper | 1 September 2001

Fabrication of refractive microlens array by etching dichromate gelatin with enzyme solution

Jun Yao, Fuhua Gao, Yongkang Guo, Zheng Cui

OE, Vol. 40, Issue 09, (September 2001) https://doi.org/10.1117/12.10.1117/1.1391259

KEYWORDS: Water, Microlens array, Molecules, Hydrogen, Etching, Proteins, Chemical elements, Photoresist materials, Chromium, Microlens

Proceedings Article | 30 April 2001 Paper

Profile control of SU-8 photoresist using different radiation sources

Zheng Cui, Derek Jenkins, Andreas Schneider, Geoff McBride

Proceedings Volume 4407, (2001) https://doi.org/10.1117/12.425291

KEYWORDS: Photoresist materials, X-rays, Ultraviolet radiation, Electron beams, Electron beam lithography, Collimators, Scattering, Mercury, Lamps, Laser scattering

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Proceedings Article | 30 April 2001 Paper

Electrothermal modeling of silicon PCR chips

Zheng Cui, Zhan Zhao, Shanhong Xia

Proceedings Volume 4407, (2001) https://doi.org/10.1117/12.425312

KEYWORDS: Silicon, Liquids, Modeling, Silicon films, Thin films, Etching, Semiconducting wafers, Microelectromechanical systems, Computer simulations, Oxides

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Proceedings Article | 26 April 2001 Paper

Investigation of OPC mask distortion effect

Zheng Cui, Jinglei Du

Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425225

KEYWORDS: Photomasks, Electron beam lithography, Optical proximity correction, Optical lithography, Distortion, Optical simulations, Lithography, Laser scanners, Photoresist materials, Semiconducting wafers

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Proceedings Article | 5 April 2001 Paper

Thermally excited SiN beam resonant pressure sensor

Deyong Chen, Dafu Cui, Zhongyao Yu, Li Wang, Zheng Cui, Shanhong Xia

Proceedings Volume 4408, (2001) https://doi.org/10.1117/12.425398

KEYWORDS: Sensors, Silicon, Resonators, Finite element methods, Resistors, Microelectromechanical systems, Silicon films, Signal detection, Crystals, Laser crystals

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Proceedings Article | 5 April 2001 Paper

Design and modeling of a silicon resonant pressure sensor

Zheng Cui, Deyong Chen, Shanhong Xia

Proceedings Volume 4408, (2001) https://doi.org/10.1117/12.425388

KEYWORDS: Silicon, Sensors, Silicon films, Resonators, Thin films, Platinum, Computer simulations, Signal detection, Electrodes, Modeling

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Proceedings Article | 18 August 2000 Paper

Fabrication of refractive microlens array by etching ammonium dichromate gelatin (ADG) with enzyme

Jun Yao, Fuhua Gao, Feng Gao, Yixiao Zhang, Jingqin Su, Yongkang Guo, Zheng Cui

Proceedings Volume 4179, (2000) https://doi.org/10.1117/12.395682

KEYWORDS: Water, Molecules, Proteins, Microlens, Microlens array, Etching, Hydrogen, Photoresist materials, Chemical elements, Binary data

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Proceedings Article | 5 July 2000 Paper

Modified proximity function for OPC in laser direct writing

Jinglei Du, Fuhua Gao, Yixiao Zhang, Yongkang Guo, Chunlei Du, Zheng Cui

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388940

KEYWORDS: Photoresist materials, Optical proximity correction, Optical simulations, Laser scattering, Photoresist developing, Scattering, Lithography, Distortion, Microfabrication, Electron beam lithography

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SPIE Journal Paper | 1 March 2000

Precompensation approach for improving the quality of laser direct writing patterns by a modified proximity function

Jinglei Du, Fuhua Gao, Yongkang Guo, Chunlei Du, Chuankai Qiu, Zheng Cui

OE, Vol. 39, Issue 03, (March 2000) https://doi.org/10.1117/12.10.1117/1.602426

KEYWORDS: Photoresist materials, Lithography, Distortion, Optical proximity correction, Laser scattering, Optical simulations, Scattering, Photomasks, Printing, Microfabrication

Proceedings Article | 26 July 1999 Paper

Optical proximity correction for submicron lithography by laser direct writing

Yongkang Guo, Jinglei Du, Qizhong Huang, Jun Yao, Chuankai Qiu, Zheng Cui

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354383

KEYWORDS: Lithography, Optical proximity correction, Laser systems engineering, Laser optics, Electron beam lithography, Optical lithography, Projection lithography, Distortion, Laser scattering, Submicron lithography

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Proceedings Article | 25 June 1999 Paper

MOSCASEL: a total solution to electron-beam lithography simulation

Zheng Cui

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351122

KEYWORDS: Monte Carlo methods, Electron beam lithography, Computer simulations, Scattering, Silicon, Optical simulations, Lithography, Signal detection, Laser scattering, Semiconducting wafers

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Proceedings Article | 7 May 1999 Paper

Fine OPC approach with gray-tone coding mask

Jinglei Du, Jingqin Su, Qizhong Huang, Yixiao Zhang, Yongkang Guo, Chunlei Du, Zheng Cui

Proceedings Volume 3740, (1999) https://doi.org/10.1117/12.347834

KEYWORDS: Optical proximity correction, Photomasks, Image compression, Modulation, Optical lithography, Image filtering, Microfabrication, Imaging systems, Computer simulations, Light sources

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Proceedings Article | 10 March 1999 Paper

New method to design halftone mask for the fabrication of continuous microrelief structure

Jingqin Su, Jinglei Du, Jun Yao, Fuhua Gao, Yongkang Guo, Zheng Cui

Proceedings Volume 3680, (1999) https://doi.org/10.1117/12.341286

KEYWORDS: Photomasks, Modulation, Photoresist developing, Optical lithography, Image processing, 3D modeling, Photoresist materials, Computer simulations, Electron beam lithography, Photoresist processing

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Proceedings Article | 29 June 1998 Paper

New method for optical proximity correction with gray-level serifs

Jinglei Du, Qizhong Huang, Yongkang Guo, Zheng Cui

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310722

KEYWORDS: Optical proximity correction, Photomasks, Image quality, Image transmission, Distortion, Optical lithography, Image processing, Transmittance, Image resolution, Mechanics

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Proceedings Article | 5 June 1998 Paper

TEMP: a software package for simulation of resist heating in electron-beam lithography

Zheng Cui

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309596

KEYWORDS: Monte Carlo methods, Thermal effects, 3D modeling, Electron beam lithography, Photomasks, Computer simulations, Temperature metrology, Optical simulations, Diffusion, Scattering

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SPIE Journal Paper | 1 May 1998

Design of diffractive optical elements based on several simple formulae

Mingbao Zhou, Dajian Lin, Zheng Cui, Philip Prewett, Lurong Guo, Yongkang Guo

OE, Vol. 37, Issue 05, (May 1998) https://doi.org/10.1117/12.10.1117/1.601680

KEYWORDS: Diffractive optical elements, Optical design, Diffraction, Wavefronts, Far-field diffraction, Quantization, Beam splitters, Image transmission, Optical engineering, Electronics

Proceedings Article | 25 September 1997 Paper

Simulation of microstrip deflectors for field emission display

Zheng Cui

Proceedings Volume 3155, (1997) https://doi.org/10.1117/12.279404

KEYWORDS: Finite element methods, Field emission displays, Electrons, Electrodes, Computer simulations, Optical resolution, LCDs, Manufacturing, Chemical elements, Image resolution

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Proceedings Article | 7 July 1997 Paper

Focused-ion-beam repair of embedded phase-shift masks

Zheng Cui, Philip Prewett, John Watson

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276022

KEYWORDS: Phase shifts, Gallium, Ion beams, Ions, Plasma etching, Etching, Plasma, Sputter deposition, Phase shifting, Opacity

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Proceedings Article | 7 July 1997 Paper

Sub-150-nm electron-beam lithography using AZPN114 chemically amplified resist

Zheng Cui, R. Moody, Ian Loader, John Watson, Philip Prewett

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275869

KEYWORDS: Critical dimension metrology, Chemically amplified resists, Electron beam lithography, Photoresist processing, Electron beams, Manufacturing, Lithography, Silicon, Scanning electron microscopy, Metrology

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Proceedings Article | 26 May 1995 Paper

Partial rim: a new design of rim phase shift mask for submicron contact holes

Zheng Cui, Philip Prewett, Brian Martin

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209284

KEYWORDS: Photomasks, Image enhancement, Phase shifts, Image quality, Computer simulations, Lithography, Semiconducting wafers, Etching, Quartz, Reticles

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Proceedings Article | 22 May 1995 Paper

Printability and repair of defects in rim and attenuated phase shift masks

Philip Prewett, Zheng Cui, John Watson, Brian Martin

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209204

KEYWORDS: Phase shifts, Photomasks, Gallium, Ion beams, Opacity, Ions, Lithography, Optical lithography, Signal attenuation, Carbon

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Proceedings Article | 19 May 1995 Paper

Experimental study of proximity effect corrections in electron-beam lithography

Jianguo Zhu, Zheng Cui, Philip Prewett

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209175

KEYWORDS: Scattering, Polymethylmethacrylate, Electron beams, Laser scattering, Lithography, Data modeling, Electron beam lithography, Software, Critical dimension metrology, Scanning electron microscopy

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Proceedings Article | 17 May 1994 Paper

Comparison of phase-shift mask types for submicrometer contact hole definition

Zheng Cui, Brian Martin, Philip Prewett, Steve Johnson, Philip Herman

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175420

KEYWORDS: Photomasks, Phase shifts, Binary data, Lithography, Computer simulations, Image analysis, Quartz, Etching, Transmittance, Semiconductors

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Showing 5 of 38 publications

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