Mr. Yoshi Hishiro Profile

Yoshi Hishiro

at JSR Micro Inc

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 5 May 2017 Presentation

Presentation

Novel EUV photoresist for sub-7nm node (Conference Presentation)

Tsuyoshi Furukawa, Takehiko Naruoka, Hisashi Nakagawa, Hiromu Miyata, Motohiro Shiratani, Masafumi Hori, Satoshi Dei, Ramakrishnan Ayothi, Yoshi Hishiro, Tomoki Nagai

Proceedings Volume 10143, 101430X (2017) https://doi.org/10.1117/12.2258164

KEYWORDS: Line edge roughness, Semiconductors, Semiconductor manufacturing, Lithography, Photoresist processing, High volume manufacturing, Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials

Read Abstract +

Proceedings Article | 6 April 2015 Paper

Paper

Novel EUV resist development for sub-14nm half pitch

Masafumi Hori, Takehiko Naruoka, Hisashi Nakagawa, Tomohisa Fujisawa, Takakazu Kimoto, Motohiro Shiratani, Tomoki Nagai, Ramakrishnan Ayothi, Yoshi Hishiro, Kenji Hoshiko, Toru Kimura

Proceedings Volume 9422, 94220P (2015) https://doi.org/10.1117/12.2085927

KEYWORDS: Semiconductors, Semiconductor manufacturing, Chemical species, Optical lithography, Chemically amplified resists, Lithography, Line width roughness, Diffusion, Extreme ultraviolet lithography, Extreme ultraviolet

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Paper

Novel EUV resist materials for 16nm half pitch and EUV resist defects

Motohiro Shiratani, Takehiko Naruoka, Ken Maruyama, Ramakrishnan Ayothi, Yoshi Hishiro, Kenji Hoshiko, Andreia Santos, Xavier Buch, Tooru Kimura

Proceedings Volume 9048, 90481D (2014) https://doi.org/10.1117/12.2046133

KEYWORDS: Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Lithography, Fluorine, Semiconducting wafers, Diffusion, Chemical species, Line edge roughness, Absorbance

Read Abstract +

Proceedings Article | 27 March 2014 Paper

Paper

Spin-on organic hardmask for topo-patterned substrate

Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, Srinivasan Balakrishnan, Luisa Bozano, Ananthakrishnan Sankaranarayanan, Krishna Bajjuri, Daniel Sanders, Carl Larson, Anuja DeSilva, Martin Glodde

Proceedings Volume 9051, 905115 (2014) https://doi.org/10.1117/12.2046357

KEYWORDS: Fourier transforms, Chemical vapor deposition, Photoresist materials, Resistance, Carbon, Photomasks, Optical lithography, Lithography, Glasses

Read Abstract +

Proceedings Article | 10 April 2013 Open Access

Open Access

Paper

The evolving complexity of patterning materials

Tsutomu Shimokawa, Yoshi Hishiro, Yoshikazu Yamaguchi, Motoyuki Shima, Tooru Kimura, Yoshio Takimoto, Tomoki Nagai

Proceedings Volume 8682, 868202 (2013) https://doi.org/10.1117/12.2014526

KEYWORDS: Photomasks, Lithography, Chemical elements, Oxides, Scanners, Metals, Double patterning technology, Photoresist materials, Extreme ultraviolet lithography, Optical lithography

Read Abstract +

Proceedings Article | 10 April 2013 Paper

Paper

3D AFM method for characterization of resist effect of aerial image contrast on side wall roughness

Yong-ha Lee, Sang-Joon Cho, Sang-il Park, R. Ayothi, Y. Hishiro

Proceedings Volume 8681, 86812Y (2013) https://doi.org/10.1117/12.2013657

KEYWORDS: Semiconductors, Laser scanners, Scanners, 3D scanning, 3D image processing, Scanning electron microscopy, Line width roughness, Atomic force microscopy, Photoresist materials, Line edge roughness

Read Abstract +

Proceedings Article | 29 March 2013 Paper

Paper

Novel EUV resist materials and process for 20nm half pitch and beyond

Ken Maruyama, Ramakrishnan Ayothi, Yoshi Hishiro, Koji Inukai, Motohiro Shiratani, Tooru Kimura

Proceedings Volume 8682, 86820B (2013) https://doi.org/10.1117/12.2011243

KEYWORDS: Photomasks, Optical lithography, Scanning electron microscopy, Lithography, Line width roughness, Extreme ultraviolet lithography, Diffusion, Absorption, Silicon, Extreme ultraviolet

Read Abstract +

Proceedings Article | 26 March 2013 Paper

Paper

Polymer blends for directed self-assembly

Yuuji Namie, Yusuke Anno, Takehiko Naruoka, Shinya Minegishi, Tomoki Nagai, Yoshi Hishiro, Yoshikazu Yamaguchi

Proceedings Volume 8680, 86801M (2013) https://doi.org/10.1117/12.2011418

KEYWORDS: Polymers, Optical lithography, Photoresist materials, Annealing, Lithography, Materials processing, Photoresist developing, Directed self assembly, Interfaces, Photoresist processing

Read Abstract +

Proceedings Article | 23 March 2012 Paper

Paper

Key parameters of EUV resists for contact hole applications

Kyoungyong Cho, Hiroki Nakagawa, Ken Maruyama, Makoto Shimizu, Tooru Kimura, Yoshi Hishiro

Proceedings Volume 8322, 83221B (2012) https://doi.org/10.1117/12.916837

KEYWORDS: Semiconducting wafers, Lithographic illumination, Photomasks, Chemically amplified resists, Critical dimension metrology, Extreme ultraviolet lithography, Optical lithography, Lithography, Extreme ultraviolet, Diffusion

Read Abstract +

Proceedings Article | 20 March 2012 Paper

Paper

Investigation of pattern wiggling for spin-on organic hardmask materials

Goji Wakamatsu, Kentaro Goto, Yoshi Hishiro, Taiichi Furukawa, Satoru Murakami, Masayuki Motonari, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Anuja DeSilva, Noel Arellano, Luisa Bozano, Carl Larson, Martin Glodde, Ratnam Sooriyakumaran

Proceedings Volume 8325, 83250T (2012) https://doi.org/10.1117/12.915698

KEYWORDS: Extreme ultraviolet, Double patterning technology, Critical dimension metrology, Optical lithography, Fourier transforms, Fluorine, Chemical vapor deposition, Hydrogen, Resistance, Etching

Read Abstract +

Proceedings Article | 8 March 2012 Paper

Paper

EUV resist development for 16nm half pitch

Ken Maruyama, Hiroki Nakagawa, Shalini Sharma, Yoshi Hishiro, Makoto Shimizu, Tooru Kimura

Proceedings Volume 8325, 83250A (2012) https://doi.org/10.1117/12.916555

KEYWORDS: Semiconducting wafers, Silicon, Photomasks, Manufacturing, Optical lithography, Immersion lithography, Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Diffusion

Read Abstract +

Proceedings Article | 16 April 2011 Paper

Paper

Ultra-thin-film EUV resists beyond 20nm lithography

Hiroki Nakagawa, Tomohisa Fujisawa, Kentaro Goto, Tooru Kimura, Toshiyuki Kai, Yoshi Hishiro

Proceedings Volume 7972, 79721I (2011) https://doi.org/10.1117/12.879303

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Etching, Diffusion, Semiconducting wafers, Line width roughness, Photoresist processing, Silica, Optical lithography

Read Abstract +

Proceedings Article | 23 March 2010 Paper

Paper

Scissionable polymer resists for extreme ultraviolet lithography

Yoichi Ogata, Georgeta Masson, Yoshi Hishiro, James Blackwell

Proceedings Volume 7636, 763634 (2010) https://doi.org/10.1117/12.847320

KEYWORDS: Extreme ultraviolet lithography, Polymerization, Lithography, Photoresist materials, Electron beam lithography, Thin films, Magnesium, Temperature metrology, Extreme ultraviolet, Polymers

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Paper

Incorporating organosilanes into EUV photoresists: diphenyltrimethylsilylmethylsulfonium triflate as a new PAG

Shalini Sharma, Yoichi Ogata, Clarion Tung, James Blackwell, Todd Younkin, Yoshi Hishiro, Joshua Figueroa, Arnold Rheingold

Proceedings Volume 7273, 72733N (2009) https://doi.org/10.1117/12.814220

KEYWORDS: Extreme ultraviolet lithography, Line width roughness, Optical transfer functions, Optical lithography, Photoresist materials, Semiconducting wafers, Chemistry, Extreme ultraviolet, Polymers, Lithography

Read Abstract +

Proceedings Article | 4 April 2008 Paper

Paper

Characterization of resist and topcoat properties for immersion lithography

Kaveri Jain, Yoshi Hishiro

Proceedings Volume 6923, 692320 (2008) https://doi.org/10.1117/12.773318

KEYWORDS: Fluorine, Polymers, Surface roughness, Nitrogen, Immersion lithography, Profiling, Atomic force microscopy, Polymer thin films, Semiconducting wafers, Sulfur

Read Abstract +

Proceedings Article | 23 March 2007 Paper

Paper

Thin bilayer resists for 193-nm and future photolithography II

Yoshi Hishiro, Michael Hyatt

Proceedings Volume 6519, 651935 (2007) https://doi.org/10.1117/12.712737

KEYWORDS: Scanning electron microscopy, Interferometers, Silicon, Scanners, Etching, Thin films, Lithographic illumination, Immersion lithography, Line edge roughness, Lithography

Read Abstract +

Proceedings Article | 11 April 2006 Paper

Paper

Fundamental characterization of silicon-containing spin-on hardmask for 193nm photolithography

Vishal Sipani, Yoshi Hishiro, Mirzafer Abatchev

Proceedings Volume 6153, 61532U (2006) https://doi.org/10.1117/12.659102

KEYWORDS: Etching, Silicon, Plasmas, Chemical vapor deposition, Photoresist materials, Reflectivity, Oxides, Silicon carbide, Polymers, Semiconducting wafers

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Paper

Thin bilayer resists approach for 193nm and future photolithography

Yoshi Hishiro, Michael Hyatt

Proceedings Volume 6153, 61532W (2006) https://doi.org/10.1117/12.659630

KEYWORDS: Silicon, Etching, Lithography, Thin films, Photoresist processing, Plasma, Carbon, FT-IR spectroscopy, Scanning electron microscopy, Oxidation

Read Abstract +

Showing 5 of 18 publications

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement