Dr. Yiping Yao Profile

Dr. Yiping Yao

at IBM Corp

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 23 March 2020 Presentation + Paper

Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance

Chris Robinson, Cody Murray, Luciana Meli, Anuja De Silva, Dario Goldfarb, Conor Thomas, Madhana Sunder, Mary Ann Zaitz, Guoda Lian, Yiping Yao, Leo Tai, Jay Bunt, Jim Rosa, Malik Ali, Steven Boettcher, Mark Stalter

Proceedings Volume 11323, 113230P (2020) https://doi.org/10.1117/12.2551612

KEYWORDS: Scanners, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Carbon, Contamination, Calibration, Sensors, Extreme ultraviolet

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SPIE Journal Paper | 31 July 2018

Inorganic hardmask development for extreme ultraviolet patterning

Anuja De Silva, Ashim Dutta, Luciana Meli, Yiping Yao, Yann Mignot, Jing Guo, Nelson Felix

JM3, Vol. 18, Issue 01, 011004, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011004

KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Head-mounted displays, Silicon, Chemistry, Amorphous silicon, Argon, Polymers, Interfaces

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Proceedings Article | 19 March 2018 Presentation + Paper

Inorganic hardmask development for EUV patterning

Anuja De Silva, Ashim Dutta, Luciana Meli, Yiping Yao, Yann Mignot, Jing Guo, Nelson Felix

Proceedings Volume 10583, 105830V (2018) https://doi.org/10.1117/12.2296751

KEYWORDS: Etching, Optical lithography, Chemistry, Head-mounted displays, Silicon, Argon, Amorphous silicon, Polymers, Extreme ultraviolet, Interfaces

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SPIE Journal Paper | 23 May 2017

Development of TiO₂ containing hardmasks through plasma-enhanced atomic layer deposition

Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hoa Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy

JM3, Vol. 16, Issue 02, 023504, (May 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023504

KEYWORDS: Titanium dioxide, Metals, Atomic layer deposition, Optical lithography, Etching, Dry etching, Contamination, Modulation, Wet etching, Lithography

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Proceedings Article | 27 March 2017 Presentation + Paper

Development of TiO2 containing hardmasks through PEALD deposition

Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hao Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy

Proceedings Volume 10146, 1014615 (2017) https://doi.org/10.1117/12.2258380

KEYWORDS: Metals, Titanium, Lithography, Optical lithography, Dry etching, Etching, Photoresist materials, Titanium dioxide, Wet etching, Plasma, Carbon

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