Achieving sub-nanometer precision in ion beam figuring (IBF) processes demands a comprehensive understanding and optimization of various key aspects, including metrology, dwell time optimization, velocity scheduling, positioning, and final inspection. In this study, these aspects are analyzed and discussed. Our solutions for the challenges in each aspect are highlighted, with implications for a wide range of applications requiring ultra-precise optical components.
At the National Synchrotron Light Source II, a beamline has been designed that aims to meet the needs of general CDI experiments at x-ray energies between 5 and 15 keV, where access to nanoscale information can be provided in “full-field” images of micron-sized particles in Bragg- and forward-scattering geometries. Here, we present the optical design underlying the proposed beamline, which delivers a variably-sized focal spot in the micron range with independently vari
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