Dr. Wenhui Wang Profile

Dr. Wenhui Wang

Engineer at Applied Materials

SPIE Involvement:

Author

Publications (24)

Proceedings Article | 26 April 2017 Presentation

Design grid optimization for OPC of silicon photonics (Conference Presentation)

Wenhui Wang, Xiaochi Chen, Lei Sun, Alexander Piggott, Jelena Vuckovic, Jongwook Kye

Proceedings Volume 10147, 1014710 (2017) https://doi.org/10.1117/12.2261428

KEYWORDS: Optical proximity correction, Silicon photonics, High volume manufacturing, Sun, Optical lithography, Current controlled current source

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Proceedings Article | 28 March 2017 Paper

High throughput and dense sampling metrology for process control

Lei Sun, Tsunehito Kohyama, Kuniaki Takeda, Hiroto Nozawa, Yuji Asakawa, Taher Kagalwala, Granger Lobb, Frank Mont, Xintuo Dai, Shyam Pal, Wenhui Wang, Jongwook Kye, Francis Goodwin

Proceedings Volume 10145, 101452D (2017) https://doi.org/10.1117/12.2258623

KEYWORDS: Process control, Metrology, Optical metrology, Defect inspection, Inspection, Semiconducting wafers, Critical dimension metrology, Finite element methods, Wafer-level optics, Line edge roughness, Lithography, Optics manufacturing

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Proceedings Article | 24 March 2016 Paper

LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL)

Nihar Mohanty, Richard Farrell, Cheryl Periera, Kal Subhadeep, Elliott Franke, Jeffrey Smith, Akiteru Ko, Anton DeVilliers, Peter Biolsi, Lei Sun, Genevieve Beique, Erik Hosler, Erik Verdujn, Wenhui Wang, Cathy Labelle, Ryoung-han Kim

Proceedings Volume 9782, 97820Q (2016) https://doi.org/10.1117/12.2219259

KEYWORDS: Etching, Line edge roughness, Optical lithography, Back end of line, Chemistry, Front end of line, Lithography, Ions, Amorphous silicon, Extreme ultraviolet

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Proceedings Article | 18 March 2016 Paper

Comparison of left and right side line edge roughness in lithography

Lei Sun, Nicole Saulnier, Genevieve Beique, Erik Verduijn, Wenhui Wang, Yongan Xu, Hao Tang, Yulu Chen, Ryoung-han Kim, John Arnold, Nelson Felix, Matthew Colburn

Proceedings Volume 9778, 977822 (2016) https://doi.org/10.1117/12.2219665

KEYWORDS: Line edge roughness, Metrology, Lithography, Etching, Semiconductors, Scattering, Inspection, Critical dimension metrology, Photomasks, Roads, Extreme ultraviolet lithography

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Proceedings Article | 15 March 2016 Paper

Line edge roughness frequency analysis for SAQP process

Lei Sun, Xiaoxiao Zhang, Shimon Levi, Adam Ge, Hua Zhou, Wenhui Wang, Navaneetha Krishnan, Yulu Chen, Erik Verduijn, Ryoung-han Kim

Proceedings Volume 9780, 97801S (2016) https://doi.org/10.1117/12.2229176

KEYWORDS: Line edge roughness, Line width roughness, Lithography, Optical lithography, Semiconductor manufacturing, Chemical mechanical planarization, Dielectrophoresis

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SPIE Journal Paper | 13 July 2015

Line edge roughness frequency analysis during pattern transfer in semiconductor fabrication

Lei Sun, Wenhui Wang, Genevieve Beique, Min Sung, Obert Wood, Ryoung-Han Kim

JM3, Vol. 14, Issue 03, 033501, (July 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.033501

KEYWORDS: Line edge roughness, Line width roughness, Semiconductors, Reactive ion etching, Double patterning technology, Lithography, Oxides, Extreme ultraviolet lithography, Optical inspection, Visualization

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Proceedings Article | 19 March 2015 Paper

Application of frequency domain line edge roughness characterization methodology in lithography

Lei Sun, Wenhui Wang, Genevieve Beique, Obert Wood, Ryoung-Han Kim

Proceedings Volume 9424, 942404 (2015) https://doi.org/10.1117/12.2086961

KEYWORDS: Line edge roughness, Line width roughness, Etching, Visualization, Lithography, Semiconductors, Optical inspection, Neodymium, Semiconducting wafers, Edge roughness

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Proceedings Article | 13 March 2015 Paper

EUV processing and characterization for BEOL

Nicole Saulnier, Yongan Xu, Wenhui Wang, Lei Sun, Lin Lee Cheong, Romain Lallement, Genevieve Beique, Bassem Hamieh, John Arnold, Nelson Felix, Matthew Colburn

Proceedings Volume 9422, 94220T (2015) https://doi.org/10.1117/12.2086126

KEYWORDS: Semiconducting wafers, Etching, Line edge roughness, Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Scanning electron microscopy, Lithography, Scanners

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Proceedings Article | 2 April 2014 Paper

Mean offset optimization for multi-patterning overlay using Monte Carlo simulation method

Wenhui Wang, Liping Cui, Lei Sun, Ryoung-Han Kim

Proceedings Volume 9050, 90502O (2014) https://doi.org/10.1117/12.2046580

KEYWORDS: Optical alignment, Monte Carlo methods, Overlay metrology, Optical lithography, Tolerancing, Lithography, Double patterning technology, Control systems, Manufacturing, Extreme ultraviolet lithography

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SPIE Journal Paper | 17 December 2013 Open Access

Review of resist-based flare measurement methods for extreme ultraviolet lithography

Lei Sun, Obert Wood, Erik Verduijn, Mandeep Singh, Wenhui Wang, Ryoung-Han Kim, Pawitter Mangat, Hui Peng Koh, Harry Levinson

JM3, Vol. 12, Issue 04, 042001, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.042001

KEYWORDS: Point spread functions, Modulation transfer functions, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet, Light scattering, Scattering, Photomasks, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 17 May 2011 Paper

Ultra fast all-optical fiber pressure sensor for blast event evaluation

Nan Wu, Wenhui Wang, Ye Tian, Christopher Niezrecki, Xingwei Wang

Proceedings Volume 7753, 77535J (2011) https://doi.org/10.1117/12.885104

KEYWORDS: Sensors, Fiber optics sensors, Optical fibers, Traumatic brain injury, Silica, Multimode fibers, Ultrafast phenomena, Fabry–Perot interferometers, Silicon, Data processing

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Proceedings Article | 16 May 2011 Paper

A miniature pressure sensor for blast event evaluation

Nan Wu, Wenhui Wang, Ye Tian, Christopher Niezrecki, Xingwei Wang

Proceedings Volume 8029, 80290V (2011) https://doi.org/10.1117/12.884278

KEYWORDS: Sensors, Fiber optics sensors, Silicon, Fiber optics, Traumatic brain injury, Polishing, Microelectromechanical systems, Wave propagation, Fabry–Perot interferometers, Interfaces

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Proceedings Article | 27 April 2010 Paper

Surface-enhanced Raman scattering on optical material fabricated by femtosecond laser

Wenhui Wang, Haibin Huo, Nan Wu, Mengyan Shen, Charles Guthy, Xingwei Wang

Proceedings Volume 7673, 76730K (2010) https://doi.org/10.1117/12.852617

KEYWORDS: Optical fibers, Raman spectroscopy, Quartz, Raman scattering, Femtosecond phenomena, Silica, Nanolithography, Nanostructures, Sensors, Scanning electron microscopy

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Proceedings Article | 27 April 2010 Paper

Label-free detection of biomolecules using a tapered optical fiber sensor

Ye Tian, Wenhui Wang, Armand Chery, Nan Wu, Charles Guthy, Xingwei Wang

Proceedings Volume 7673, 767307 (2010) https://doi.org/10.1117/12.852215

KEYWORDS: Sensors, Refractive index, Biosensors, Tapered optical fibers, Structured optical fibers, Cladding, Optical fibers, Single mode fibers, 3D modeling, Fiber optics sensors

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Proceedings Article | 20 April 2010 Paper

Theoretical analysis of a novel ultrasound generator on an optical fiber tip

Nan Wu, Wenhui Wang, Ye Tian, Charles Guthy, Xingwei Wang

Proceedings Volume 7677, 76770X (2010) https://doi.org/10.1117/12.852210

KEYWORDS: Absorption, Ultrasonography, Gold, Optical fibers, Nanoparticles, Pulsed laser operation, Mie scattering, Photoacoustic spectroscopy, Acoustics, Transform theory

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Proceedings Article | 20 April 2010 Paper

Simulation of a novel ultrasound generator-receiver on a single optical fiber

Xingwei Wang, Chunyang Liu, Nan Wu, Wenhui Wang, Charles Guthy, Ye Tian, Chengyu Cao

Proceedings Volume 7677, 76770Y (2010) https://doi.org/10.1117/12.852590

KEYWORDS: Ultrasonography, Nanoparticles, Optical fibers, Gold, Receivers, Finite element methods, Pulsed laser operation, Optical simulations, Interfaces, Single mode fibers

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Proceedings Article | 20 April 2010 Paper

Dynamic test of an acoustic/pressure sensor with precise cavity length control

Wenhui Wang, Nan Wu, Ye Tian, Charles Guthy, Xingwei Wang, Christopher Niezrecki

Proceedings Volume 7677, 76770W (2010) https://doi.org/10.1117/12.852614

KEYWORDS: Sensors, Fiber optics sensors, Silicon, Optical sensors, Laser sources, Interferometers, Microelectromechanical systems, Sensor performance, Sensor calibration, Calibration

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Proceedings Article | 24 February 2010 Paper

Thin film thickness variation measurement using dual LEDs and reflectometric interference spectroscopy model in biosensor

Yunfeng Ling, Nan Wu, Wenhui Wang, Leslie Farris, Byungki Kim, Xingwei Wang, Melisenda McDonald

Proceedings Volume 7559, 75590K (2010) https://doi.org/10.1117/12.842612

KEYWORDS: Light emitting diodes, Sensors, Thin films, Reflectance spectroscopy, Biosensors, Atomic force microscopy, Silica, Thin film devices, Spectrometers, Polymethylmethacrylate

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Proceedings Article | 13 February 2010 Paper

Label-free detection of biomolecules using LED technology

Nan Wu, Wenhui Wang, Yunfeng Ling, Leslie Farris, Byungki Kim, Melisenda McDonald, Xingwei Wang

Proceedings Volume 7574, 75740I (2010) https://doi.org/10.1117/12.842034

KEYWORDS: Light emitting diodes, Sensors, Polymethylmethacrylate, Interferometry, Reflectivity, Biosensors, Silicon, Light sources, Reflection, Proteins

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Proceedings Article | 4 October 2007 Paper

Nanoscale and manufacturable sensing tip for biomedical applications

Xingwei Wang, Wenhui Wang

Proceedings Volume 6759, 675906 (2007) https://doi.org/10.1117/12.731130

KEYWORDS: Sensors, Nanoprobes, Biomedical optics, Manufacturing, Etching, Biosensing, Biological research, Fiber optics sensors, Near field scanning optical microscopy, Nanolithography

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Proceedings Article | 10 January 2005 Paper

Mirror-integrated arrayed-waveguide grating on silicon-on-insulator

Kemiao Jia, Wenhui Wang, Yanzhe Tang, Yirong Yang, Jianyi Yang, Xiaoqing Jiang, Yaming Wu, Minghua Wang, Yuelin Wang

Proceedings Volume 5623, (2005) https://doi.org/10.1117/12.576059

KEYWORDS: Waveguides, Mirrors, Silicon, Integrated optics, Optical lithography, Phased array optics, Demultiplexers, Dense wavelength division multiplexing, Photomasks, Light wave propagation

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SPIE Journal Paper | 1 November 2004

Design and fabrication of multimode interference coupler with strong confinement structure on silicon-on-insulator

Yanzhe Tang, Wenhui Wang, Yaming Wu, Jianyi Yang, Yuelin Wang

OE, Vol. 43, Issue 11, (November 2004) https://doi.org/10.1117/12.10.1117/1.1804545

KEYWORDS: Waveguides, Brain-machine interfaces, Silicon, Optical lithography, Silica, Single mode fibers, Structural design, Etching, Semiconducting wafers, Information science

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