Mr. Tohru Kawashima Profile

Tohru Kawashima

at Canon Inc

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Publications (1)

Proceedings Article | 23 March 2020 Presentation + Paper

Through-the-mask (TTM) optical alignment for high volume manufacturing nanoimprint lithography systems

Takamitsu Komaki, Yasuyuki Unno, Takahiro Matsumoto, Toshiki Iwai, Nozomu Hayashi, Tomokazu Taki, Tohru Kawashima, Satoshi Iino, Shinichirou Hirai, Ken Minoda, Takafumi Miyaharu, Kazuhiro Takahashi, Kazuhiko Mishima

Proceedings Volume 11327, 113270Y (2020) https://doi.org/10.1117/12.2551980

KEYWORDS: Optical alignment, Semiconducting wafers, Photomasks, Nanoimprint lithography, Overlay metrology, Error analysis, Wafer testing, Diffraction, High volume manufacturing, Distortion

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