Mr. Thomas Struck Profile

Thomas Struck

Director, Materials Management at Infineon Technologies AG

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Publications (14)

Proceedings Article | 17 October 2008 Paper

True reticle cost saving by multi level reticle approach

Thomas Struck, Hendrik Kirbach

Proceedings Volume 7122, 712233 (2008) https://doi.org/10.1117/12.800920

KEYWORDS: Reticles, Photomasks, Semiconducting wafers, Manufacturing, Computer aided design, Logic, Prototyping, Optical alignment, Product engineering, Standards development

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Proceedings Article | 28 May 2003 Paper

Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec DUV tool

Gerd Scheuring, Alexander Petrashenko, Stefan Doebereiner, Frank Hillmann, Hans-Jurgen Bruck, Andrew Hourd, Anthony Grimshaw, Gordon Hughes, Shiuh-Bin Chen, Parkson Chen, Thomas Schatz, Thomas Struck, Paul van Adrichem, Herman Boerland, Sigrid Lehnigk

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515107

KEYWORDS: Photomasks, Critical dimension metrology, Reticles, Inspection, Deep ultraviolet, Metrology, Binary data, Objectives, Environmental sensing, Cameras

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Proceedings Article | 16 August 2002 Paper

Measures to achieve 20nm IPL stencil mask distortion

Ernst Haugeneder, A. Chalupka, T Lammer, Hans Loeschner, Frank-Michael Kamm, Thomas Struck, Albrecht Ehrmann, Rainer Kaesmaier, Andreas Wolter, Joerg Butschke, Mathias Irmscher, Florian Letzkus, Reinhard Springer

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479353

KEYWORDS: Photomasks, Semiconducting wafers, Distortion, Silicon, Ion beams, Electrodes, Ions, Wafer bonding, Manufacturing, Projection lithography

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Proceedings Article | 20 August 2001 Paper

Progress in placement control for ion beam stencil mask technology

Frank-Michael Kamm, Albrecht Ehrmann, Thomas Struck, Karl Kragler, Joerg Butschke, Florian Letzkus, Reinhard Springer, Ernst Haugeneder

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436673

KEYWORDS: Photomasks, Semiconducting wafers, Ions, Etching, Projection lithography, Boron, Carbon, Beam controllers, Ion beams, Optical lithography

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Proceedings Article | 9 April 2001 Paper

Progress in placement control for ion beam stencil mask technology

Frank-Michael Kamm, Albrecht Ehrmann, Thomas Struck, Karl Kragler, Joerg Butschke, Florian Letzkus, Reinhard Springer, Ernst Haugeneder, Artur Degen, Jens Voigt, Martin Kratzenberg, Ivo Rangelow

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425098

KEYWORDS: Deposition processes, Ion implantation, Ion beams, Beam controllers, Lithography, Oxides, Carbon, Semiconducting wafers, Ions, Photomasks

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Proceedings Article | 22 January 2001 Paper

Ion projection lithography: new insights and results of this NGL technology

Thomas Struck, Albrecht Ehrmann, Rainer Kaesmaier, Hans Loeschner

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410700

KEYWORDS: Photomasks, Distortion, Semiconducting wafers, Ions, Projection lithography, Doping, Boron, Photodynamic therapy, Silicon, Electrodes

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Proceedings Article | 21 July 2000 Paper

IPL stencil mask distortions: experimental and theoretical analysis

Albrecht Ehrmann, Thomas Struck, Ernst Haugeneder, Hans Loeschner, Joerg Butschke, Florian Letzkus, Mathias Irmscher, Reinhard Springer

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390075

KEYWORDS: Photomasks, Semiconducting wafers, Etching, Silicon, Pellicles, Carbon, Ions, Projection lithography, Quartz, Manufacturing

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Proceedings Article | 21 July 2000 Paper

Stencil mask key parameter measurement and control

Albrecht Ehrmann, Annika Elsner, Roman Liebe, Thomas Struck, Joerg Butschke, Florian Letzkus, Mathias Irmscher, Reinhard Springer, Ernst Haugeneder, Hans Loeschner

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390074

KEYWORDS: Photomasks, Silicon, Carbon, Etching, Critical dimension metrology, Inspection, Semiconducting wafers, Silicon carbide, Manufacturing, Particles

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Proceedings Article | 3 February 2000 Paper

Ion projection lithography: progress in mask and tool technology

Albrecht Ehrmann, Rainer Kaesmaier, Thomas Struck

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377120

KEYWORDS: Photomasks, Ions, Electrodes, Manufacturing, Defect inspection, Pellicles, Projection lithography, Semiconducting wafers, Optical alignment, Etching

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Proceedings Article | 30 December 1999 Paper

Placement measurement and FE modeling results for distortion control of stencil masks

Albrecht Ehrmann, Thomas Struck, Rainer Kaesmaier, Ernst Haugeneder, Hans Loeschner, Joerg Butschke, Florian Letzkus, Mathias Irmscher, Reinhard Springer, Roxann Engelstad

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373376

KEYWORDS: Photomasks, Semiconducting wafers, Distortion, Silicon, Etching, Electron beam lithography, Oxides, Quartz, Semiconductor lasers, Lamps

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Proceedings Article | 30 December 1999 Paper

CD measurements of IPL stencil masks with optical microscopes

Arne Bentfeldt, Albrecht Ehrmann, Thomas Schaetz, Thomas Struck

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373377

KEYWORDS: Photomasks, Critical dimension metrology, Reflectivity, Ions, Microscopes, Projection lithography, Silicon, Optical microscopes, Semiconducting wafers, Optics manufacturing

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Proceedings Article | 14 June 1999 Paper

Matching of different pattern placement metrology systems: an example for practical use of different LMS systems in the inspection process for photomasks

Thomas Struck, Klaus-Dieter Roeth

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350795

KEYWORDS: Photomasks, Metrology, Inspection, Reticles, Calibration, Projection lithography, Ion beams, Microsystems, Image registration, Microelectronics

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Proceedings Article | 18 December 1998 Paper

Stencil mask technology for ion beam lithography

Albrecht Ehrmann, Sabine Huber, Rainer Kaesmaier, Andreas Oelmann, Thomas Struck, Reinhard Springer, Joerg Butschke, Florian Letzkus, Karl Kragler, Hans Loeschner, Ivo Rangelow

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332827

KEYWORDS: Inspection, Lithography, Ion beam lithography, Control systems, Carbon, Etching, Ions, Silicon, Semiconducting wafers, Photomasks

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Proceedings Article | 1 September 1998 Paper

Pellicle-induced distortions on photomasks

Klaus-Dieter Roeth, Thomas Struck

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328829

KEYWORDS: Pellicles, Reticles, Photomasks, Metrology, Semiconductors, Overlay metrology, Semiconducting wafers, Particles, X-ray technology, Robotic systems

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Showing 5 of 14 publications

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