Laser interference lithography (LIL) is concerned with the use of interference patterns generated from two or several
coherent beams of laser radiation for the structuring of materials. This paper presents the work on the processes based on
resists and direct writing with laser interference lithography. In the work, a four-beam laser interference system was used
as a submicrometer structuring tool in which a high-energy pulsed, frequency-tripled and TM polarized Nd:YAG laser (355 nm) with a coherent length of 3 m, energy power up to 320 mJ/cm2, pulse duration of 8 ns and 10 Hz repetition rate was used as a light source. The experimental results were achieved with 2-beam and 4-beam interference patterning. The processes can be used to define submicron surface relieves in large areas for use in the field of MEMS.
The unavoidable absorption of thin films used in antireflective coatings forms a permanent bottleneck in the
development of optics for high power laser applications. A valid alternative would be the micro-structuring of the optics
surface, realizing a diffraction grating which emulates the functioning of an Anti-Reflection thin film layer. Due to the
absence of film material, this diffractive structure would not contribute to the overall absorption of the optics. This paper
investigates the practical limits of this strategy, applied to zinc selenide as low absorption infrared substrate material.
Multi-beam laser interference lithography (MB-LIL) is a rapid and cost-effective maskless optical lithography technique
to parallelly pattern periodic or quasi- periodic micro/nano-structured material over large areas more than square
centimetres. An interference pattern between two or more coherent laser beams is set up and recorded in a recording
material of substrate. This interference pattern consists of a periodic series of geometries representing intensity minima
and maxima. The patterns that can be formed depend on the number and configuration of laser beams. This review
introduces the development and application of MB-LIL system for fabrication of micro/nano-structured material. At first,
it surveys various types of MB-LIL methods by classifying different beam configurations. Then the paper shows some
application results for fabrication 2D/3D micro/nano structure arrays by means of interference patterns with multi-exposed
or directly ablation technique. The patterend micro/nano-structure arrays include crossed diffraction grating
array in photoresist, 3D pattern in polymetric photonic crystals, and magnetic nanoarrays in thin film. Finally, an
innovative four-beam LIL system is introduced, which is being developed within the EC-granted project DELILA.
This paper presents a theoretical analysis of formation of 4-beam laser interference patterns for nanolithography.
Parameters of 4-beam interference patterns including the pattern amplitude, period, orientation and uniformity were
discussed. Analytical expressions were obtained for the spatial distribution of radiation of the interfering beams as a
function of their amplitudes, phases, angles of incidence on the sample, and polarization planes with computer
simulation and experimental results.
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