Mr. Takahiro Fukai Profile

Takahiro Fukai

at Tokyo Electron Ltd

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Publications (2)

Proceedings Article | 6 December 2004 Paper

First photomask developer based on state-of-the-art wafer processing technology

Peter Tichy, Takahiro Fukai, Shigenori Kamei, Hiroshi Asai, Tatsuhito Kotoda, Kazuhiro Takeshita, Tetsushi Miyamoto, Yoshiki Okamoto, Hideo Funakoshi, Shinji Koga, Shigemi Oono, Rusty Cantrell, Axel Feicke, Wolfram Porsche, Martin Tschinkl, Gaston Lee

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568820

KEYWORDS: Photomasks, Semiconducting wafers, Photoresist developing, Manufacturing, Critical dimension metrology, Reticles, Control systems, Diffusion, Photoresist processing, Wafer manufacturing

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Proceedings Article | 6 December 2004 Paper

Evaluation of a new-generation photomask develop system for CAR

Rusty Cantrell, Martin Tschinkl, Axel Feicke, Wolfram Porsche, Gaston Lee, Tatsuhito Kotoda, Peter Tichy, Takahiro Fukai, Shigenori Kamei, Hiroshi Asai

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568393

KEYWORDS: Photomasks, Semiconducting wafers, Particles, Deep ultraviolet, Standards development, Lithography, Manufacturing, Photoresist processing, Control systems, Diffractive optical elements

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