Dr. Susan C. Palmateer
Director, FPA Foundry at BAE Systems
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 14 June 1999 Paper
Carla Nelson-Thomas, Susan Palmateer, Anthony Forte, Susan Cann, S. Deneault, Theodore Lyszczarz
Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350860
KEYWORDS: Scanning electron microscopy, Atomic force microscopy, Silicon, Edge roughness, Semiconducting wafers, Metrology, Line edge roughness, Spatial frequencies, Critical dimension metrology, Time metrology

Proceedings Article | 29 June 1998 Paper
Susan Palmateer, Susan Cann, Jane Curtin, Scott Doran, Lynn Eriksen, Anthony Forte, Roderick Kunz, Theodore Lyszczarz, Margaret Stern, Carla Nelson-Thomas
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312395
KEYWORDS: Line edge roughness, Etching, Plasma etching, Plasma, Silicon, Reticles, Image processing, Image quality, Photoresist processing, Scanning electron microscopy

Proceedings Article | 8 June 1998 Paper
Carla Nelson-Thomas, Susan Palmateer, Theodore Lyszczarz
Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308735
KEYWORDS: Scanning electron microscopy, Edge roughness, Atomic force microscopy, Reticles, Critical dimension metrology, Metrology, Oxides, Semiconducting wafers, Line edge roughness, Spatial frequencies

Proceedings Article | 14 June 1996 Paper
Roderick Kunz, Susan Palmateer, Anthony Forte, Robert Allen, Gregory Wallraff, Richard Di Pietro, Donald Hofer
Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241835
KEYWORDS: Etching, Polymers, Resistance, Plasma, Chemistry, Metals, Semiconducting wafers, Plasma etching, Deep ultraviolet, Photoresist processing

Proceedings Article | 8 April 1996 Paper
Proceedings Volume 2703, (1996) https://doi.org/10.1117/12.237751
KEYWORDS: Lithography, Absorption, Etching, Photoresist materials, Polymers, Excimer lasers, Silica, Projection systems, Photoresist processing, Color centers

Showing 5 of 9 publications
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