There are numerous applications for multispectral filter film, including remote sensing detection, medical treatment, and military camouflage recognition. The process of preparing it is complex, which has resulted in a high price tag and low yield. We use electron beam evaporation to create five-spectral-band filter films between 380 and 900 nm using Ta2O5 and SiO2. Multispectral filter films with different bandwidths are designed using multiple methods derived from thin-film theory. Using the characteristics of each channel spectrum, three methods of monitoring film thickness were combined to prepare each channel: crystal oscillator monitoring, back-reflection monitoring, and optical transmittance monitoring. Using mechanical masks to prepare each channel individually, the transmittance over the passband is greater than 95%, and the spectral rectangle meets the requirements of applications.
With the wide application of optical thin films, the requirements for the spectral transmission range and refractive index of thin film materials are getting higher and higher. In this paper, a new type of thin film material sintered from SiO2 and Al2O3 is studied. The single-layer film was evaporated by electron beam evaporation, and its refractive index uniformity was measured by ellipsometer and its spectral transmission range was measured by spectrophotometer and Fourier spectrometer. Finally, a multi-layer high-reflection film is prepared by using the material, and the film has a high reflectivity and a flat and uniform surface.
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