Mr. Shogo Matsumaru Profile

Shogo Matsumaru

at Tokyo Ohka Kogyo Co Ltd

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Author

Publications (6)

Proceedings Article | 18 March 2016 Paper

Patterning performance of chemically amplified resist in EUV lithography

Tatsuya Fujii, Shogo Matsumaru, Tomotaka Yamada, Yoshitaka Komuro, Daisuke Kawana, Katsumi Ohmori

Proceedings Volume 9776, 97760Y (2016) https://doi.org/10.1117/12.2218417

KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Lithography, Diffusion, Extreme ultraviolet, Polymers, Chemically amplified resists, High volume manufacturing, Semiconductor manufacturing, Semiconductors, Quantum efficiency, Electrons, Semiconducting wafers

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Proceedings Article | 20 March 2015 Paper

Development of EUV chemically amplified resist which has novel protecting group

Shogo Matsumaru, Tatsuya Fujii, Takashi Kamizono, Kenta Suzuki, Hiroto Yamazaki, Masatoshi Arai, Yoshitaka Komuro, Akiya Kawaue, Daisuke Kawana, Taku Hirayama, Katsumi Ohmori

Proceedings Volume 9425, 94250U (2015) https://doi.org/10.1117/12.2087197

KEYWORDS: Polymers, Extreme ultraviolet, Quantum efficiency, Lithography, Extreme ultraviolet lithography, Semiconducting wafers, Chemically amplified resists, High volume manufacturing, Polymer thin films, Diffusion

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Proceedings Article | 1 April 2009 Paper

Topcoat-free ArF negative tone resist

Tomoyuki Ando, Sho Abe, Ryoichi Takasu, Jun Iwashita, Shogo Matsumaru, Ryoji Watanabe, Komei Hirahara, Yujiro Suzuki, Miki Tsukano, Takeshi Iwai

Proceedings Volume 7273, 727308 (2009) https://doi.org/10.1117/12.813787

KEYWORDS: Optical lithography, Lithography, Double patterning technology, Contamination, Scanners, Photomasks, Semiconducting wafers, Immersion lithography, Photoresist processing, Fluorine

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Proceedings Article | 4 December 2008 Paper

Pattern freezing process free litho-litho-etch double patterning

Tomoyuki Ando, Masaru Takeshita, Ryoich Takasu, Yasuhiro Yoshii, Jun Iwashita, Shogo Matsumaru, Sho Abe, Takeshi Iwai

Proceedings Volume 7140, 71402H (2008) https://doi.org/10.1117/12.804710

KEYWORDS: Double patterning technology, Lithography, Optical lithography, Photoresist processing, Photomasks, Semiconducting wafers, Coating, Image processing, Line width roughness, Etching

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Proceedings Article | 29 March 2006 Paper

Characteristics of low E_a 193-nm chemical amplification resists

Toshiyuki Ogata, Yohei Kinoshita, Sanae Furuya, Shogo Matsumaru, Motoki Takahashi, Daiju Shiono, Takahiro Dazai, Hideo Hada, Masamitsu Shirai

Proceedings Volume 6153, 615328 (2006) https://doi.org/10.1117/12.656199

KEYWORDS: Polymers, Plasma, Argon, Printing, Surface roughness, Lithography, FT-IR spectroscopy, Scanning electron microscopy, Photoresist processing, Electroluminescence

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Proceedings Article | 4 May 2005 Paper

Development of electron beam resists based on amorphous polyphenols with low molecular weight and narrow dispersion

Taku Hirayama, Daiju Shiono, Shogo Matsumaru, Toshiyuki Ogata, Hideo Hada, Junichi Onodera, Tadashi Arai, Toshio Sakamizu, Atsuko Yamaguchi, Hiroshi Shiraishi, Hiroshi Fukuda, Mitsuru Ueda

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600416

KEYWORDS: Line edge roughness, Ions, Scanning electron microscopy, Lithography, Etching, Polymers, Electron beams, Silicon, Semiconducting wafers, Inspection

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Showing 5 of 6 publications

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