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Shimoaoki Takeshi
at Tokyo Electron Kyushu Ltd
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Publications (1)
Proceedings Article | 23 March 2020 Paper
CD uniformity improvement for sub 20 nm DRAM process with negative tone development
Y. C. Lin, Mifong Wu, Le Wang, Baijun Sun, Hiroki Ohtaguro, Takeshi Shimoaoki, Yusaku Hashimoto, Koichi Hontake
Proceedings Volume 11326, 1132620 (2020) https://doi.org/10.1117/12.2551835
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Image processing, Particles, Manufacturing, Inspection, Photomasks, Arsenic, Extreme ultraviolet lithography, Etching
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