Dr. SherJang Singh Profile

Dr. SherJang Singh

Principal Member of Technical Staff at GLOBALFOUNDRIES Inc

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Author

Publications (20)

Proceedings Article | 27 March 2017 Paper

A study on EUV reticle surface molecular contamination under different storage conditions in a HVM foundry fab

SherJang Singh, Brett Yatzor, Ron Taylor, Obert Wood, Pawitter Mangat

Proceedings Volume 10143, 101431T (2017) https://doi.org/10.1117/12.2258393

KEYWORDS: Reticles, Extreme ultraviolet lithography, Contamination, Atmospheric particles, Extreme ultraviolet, Air contamination, Carbon, Reflectivity, Optical lithography, Pellicles, Ions, Ruthenium

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Proceedings Article | 3 October 2013 Paper

Investigation of EUVL reticle capping layer peeling under wet cleaning

Sherjang Singh, Davide Dattilo, Uwe Dietze, Arun Kadaksham, Il-Yong Jang, Frank Goodwin

Proceedings Volume 8880, 888010 (2013) https://doi.org/10.1117/12.2031430

KEYWORDS: Lamps, Photomasks, Extreme ultraviolet lithography, Ruthenium, Oxygen, Mercury, Reticles, Semiconducting wafers, Reflectivity, Ultraviolet radiation

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Proceedings Article | 28 June 2013 Paper

Effect of cleaning chemistry on MegaSonic damage

Sherjang Singh, Uwe Dietze, Peter Dress

Proceedings Volume 8701, 870104 (2013) https://doi.org/10.1117/12.2027974

KEYWORDS: Chemistry, Cavitation, Acoustics, Particles, SRAF, Ions, Photomasks, Liquids, Mask cleaning, Thermodynamics

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Proceedings Article | 28 June 2013 Paper

Megasonic cleaning: effect of dissolved gas properties on cleaning

Hrishi Shende, Sherjang Singh, James Baugh, Uwe Dietze, Peter Dress

Proceedings Volume 8701, 870105 (2013) https://doi.org/10.1117/12.2029883

KEYWORDS: Argon, Acoustics, Cavitation, Photomasks, SRAF, Stereolithography, Liquids, Energy transfer, Particles, Gases

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Proceedings Article | 1 April 2013 Paper

Extending Ru capping layer durability under physical force cleaning

SherJang Singh, Uwe Dietze, Peter Dress

Proceedings Volume 8679, 86791E (2013) https://doi.org/10.1117/12.2012265

KEYWORDS: Ruthenium, Cavitation, Acoustics, Chemistry, Reticles, Extreme ultraviolet, Particles, Critical dimension metrology, Photomasks, Extreme ultraviolet lithography

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Proceedings Article | 8 November 2012 Paper

Study of droplet spray impact on a photomask surface

SherJang Singh, Uwe Dietze, Peter Dress

Proceedings Volume 8522, 85221P (2012) https://doi.org/10.1117/12.964960

KEYWORDS: Particles, Liquids, Photomasks, Velocity measurements, Silicon, SRAF, Wavelets, Personal digital assistants, Tin, Mask cleaning

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Proceedings Article | 8 November 2012 Paper

Controlling MegaSonic performance by optimizing cleaning media's physical and gaseous properties

Hrishi Shende, SherJang Singh, James Baugh, Uwe Dietze, Peter Dress

Proceedings Volume 8522, 852217 (2012) https://doi.org/10.1117/12.979342

KEYWORDS: Chemistry, Acoustics, Stereolithography, Cavitation, Particles, Photomasks, Liquids, SRAF, Inspection, Ions

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SPIE Journal Paper | 13 September 2012

Cleaning induced imprint template erosion

SherJang Singh, Zhaoning Yu, Nobuo Kurataka, Gene Gauzner, Hongying Wang, Henry Yang, Yautzong Hsu, Kim Lee, David Kuo, Tobias Wähler, Peter Dress

JM3, Vol. 11, Issue 3, 031407, (September 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031407

KEYWORDS: Scanning probe microscopy, Beam propagation method, Contamination, Scanning electron microscopy, Silica, Inspection, Nanoimprint lithography, Hydrogen, Particles, Critical dimension metrology

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Proceedings Article | 21 March 2012 Paper

Controlling template erosion with advanced cleaning methods

SherJang Singh, Zhaoning Yu, Tobias Wähler, Nobuo Kurataka, Gene Gauzner, Hongying Wang, Henry Yang, Yautzong Hsu, Kim Lee, David Kuo, Peter Dress

Proceedings Volume 8323, 832317 (2012) https://doi.org/10.1117/12.916294

KEYWORDS: Scanning probe microscopy, Beam propagation method, Contamination, Silica, Scanning electron microscopy, Critical dimension metrology, Nanoimprint lithography, Particles, Inspection, Image analysis

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Proceedings Article | 14 October 2011 Paper

Megasonic cleaning: possible solutions for 22nm node and beyond

Hrishi Shende, Sherjang Singh, James Baugh, Raunak Mann, Uwe Dietze, Peter Dress

Proceedings Volume 8166, 816614 (2011) https://doi.org/10.1117/12.898409

KEYWORDS: Acoustics, Energy transfer, Photomasks, Cavitation, Sonoluminescence, Particles, SRAF, Chemistry, Gases, Interfaces

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Proceedings Article | 14 October 2011 Paper

Effects of cleaning on NIL templates: surface roughness, CD, and pattern integrity

Sherjang Singh, Kenji Onuki, Naoshi Kawamata, Takaharu Nagai, Masaaki Kurihara, Tatsuya Tomita, Naoya Hayashi, Peter Dress, Uwe Dietze

Proceedings Volume 8166, 81662P (2011) https://doi.org/10.1117/12.898649

KEYWORDS: Nanoimprint lithography, Particles, Surface roughness, Critical dimension metrology, Quartz, Photoresist processing, Binary data, Chromium, Silica, Inspection

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Proceedings Article | 2 April 2011 Paper

Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance

Uwe Dietze, Peter Dress, Tobias Waehler, Sherjang Singh, Rik Jonckheere, Bart Baudemprez

Proceedings Volume 7985, 79850N (2011) https://doi.org/10.1117/12.896911

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectivity, Particles, Carbon, Ruthenium, Contamination, Reticles, Mask cleaning

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Proceedings Article | 25 September 2010 Paper

Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography

C. L. Lu, C. H. Yu, W. H. Liu, Luke Hsu, Angus Chin, S. C. Lee, Anthony Yen, Gaston Lee, Peter Dress, Sherjang Singh, Uwe Dietze

Proceedings Volume 7823, 782325 (2010) https://doi.org/10.1117/12.864303

KEYWORDS: Binary data, Particles, Photomasks, SRAF, Nitrogen, Personal digital assistants, Liquids, Quartz, Mask cleaning, Atomic force microscopy

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Proceedings Article | 25 September 2010 Paper

Advanced cleaning of nano-imprint lithography template in patterned media applications

Sherjang Singh, Ssuwei Chen, Peter Dress, Nobuo Kurataka, Gene Gauzner, Uwe Dietze

Proceedings Volume 7823, 78232T (2010) https://doi.org/10.1117/12.864298

KEYWORDS: Contamination, Nanoimprint lithography, Beam propagation method, Particles, Lithography, Inspection, Scanning electron microscopy, Ultraviolet radiation, Photoresist processing, Image processing

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SPIE Journal Paper | 1 July 2010

Cleaning of step-and-flash imprint masks with damage-free nonacid technology

Sherjang Singh, Ssuwei Chen, Kosta Selinidis, Brian Fletcher, Ian McMackin, Ecron Thompson, Douglas Resnick, Peter Dress, Uwe Dietze

JM3, Vol. 9, Issue 03, 033003, (July 2010) https://doi.org/10.1117/12.10.1117/1.3462815

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Proceedings Article | 26 May 2010 Paper

Preserving the mask integrity for the lithography process

Sherjang Singh, Peter Dress, Uwe Dietze

Proceedings Volume 7748, 77480E (2010) https://doi.org/10.1117/12.865881

KEYWORDS: Photomasks, Ions, Photoresist processing, Ultraviolet radiation, Vacuum ultraviolet, Lithography, Critical dimension metrology, Chemistry, Photolysis, Mask cleaning

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Proceedings Article | 20 March 2010 Paper

Techniques for removal of contamination from EUVL mask without surface damage

Sherjang Singh, Ssuwei Chen, Tobias Wähler, Rik Jonckheere, Ted Liang, Robert Chen, Uwe Dietze

Proceedings Volume 7636, 76360Y (2010) https://doi.org/10.1117/12.847026

KEYWORDS: Reflectivity, Ultraviolet radiation, Extreme ultraviolet, Ruthenium, Photomasks, Surface roughness, Extreme ultraviolet lithography, Carbon, Particles, Contamination

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Proceedings Article | 11 May 2009 Paper

Study on surface integrity in photomask resist strip and final cleaning processes

Sherjang Singh, Stefan Helbig, Peter Dress, Uwe Dietze

Proceedings Volume 7379, 73790D (2009) https://doi.org/10.1117/12.824254

KEYWORDS: Ozone, Ruthenium, Photomasks, Photoresist processing, Reflectivity, Metals, Critical dimension metrology, Extreme ultraviolet lithography, Hydrogen, Oxidation

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Proceedings Article | 18 March 2009 Paper

Automated imprint mask cleaning for step-and-flash imprint lithography

Sherjang Singh, Ssuwei Chen, Kosta Selinidis, Brian Fletcher, Ian McMackin, Ecron Thompson, Douglas Resnick, Peter Dress, Uwe Dietze

Proceedings Volume 7271, 72712H (2009) https://doi.org/10.1117/12.814290

KEYWORDS: Photomasks, Particles, Mask cleaning, Inspection, Lithography, Scanning electron microscopy, Photoresist processing, Nanoimprint lithography, Contamination, Semiconducting wafers

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Proceedings Article | 17 October 2008 Paper

Impact of MegaSonic process conditions on PRE and sub-resolution assist feature damage

Stefan Helbig, Sabine Urban, Elizabeth Klein, Sherjang Singh

Proceedings Volume 7122, 712210 (2008) https://doi.org/10.1117/12.801408

KEYWORDS: SRAF, Cavitation, Photomasks, Acoustics, Sonoluminescence, Particles, Glasses, Inspection, Scanning electron microscopy, Mask cleaning

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Showing 5 of 20 publications

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