Dr. Shang-Chieh Chien
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 13 November 2024 Presentation
Charlie Wu, Adrian Li, Rachel Liu, Lifang Zhang, Zeyu Lei, Suresh Lakkapragada, Amo Chen, Vikram Tonali, Dongxue Chen, Mingwei Li, Shang-Chieh Chien, Ji-Rong Huang, Yi-Wun Wang, Hank Yeh, Yen-Hsun Chen, ShinAn Ku, Shu-Hsien Wu, L. Chen, Chin-Kun Wang
Proceedings Volume 13216, 132161P (2024) https://doi.org/10.1117/12.3053686

Proceedings Article | 19 March 2015 Paper
Shinn-Sheng Yu, Yen-Cheng Lu, Chih-Tsung Shih, Chia-Chun Chung, Shang-Chieh Chien, Shun-Der Wu, Norman Chen, Shu-Hao Chang, Hsiang-Yu Chou, Jui-Ching Wu, Tao-Ming Huang, Jack J. H. Chen, Anthony Yen
Proceedings Volume 9422, 94221T (2015) https://doi.org/10.1117/12.2085089
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Optical proximity correction, Reflectivity, Aluminum, Line width roughness, Light, Scanners, Light sources

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 867929 (2013) https://doi.org/10.1117/12.2010658
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Stochastic processes, Lithography, Polymers, Contamination, Scanners, Electroluminescence, Statistical modeling

Proceedings Article | 1 April 2013 Paper
Shu-Hao Chang, Shu-Fang Chen, Ying-Yu Chen, Ming-Chin Chien, Shang-Chieh Chien, Tzu-Lih Lee, Jack J. Chen, Anthony Yen
Proceedings Volume 8679, 86790O (2013) https://doi.org/10.1117/12.2010794
KEYWORDS: Contamination, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Line width roughness, Semiconducting wafers, Scanners, Ruthenium, Polymers, Carbon

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