Seejun Jeong
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 18 March 2014 Paper
Proceedings Volume 9048, 90481X (2014) https://doi.org/10.1117/12.2045877
KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Microscopes, Inspection, Scattering, Diffraction, Binary data

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 867928 (2013) https://doi.org/10.1117/12.2011362
KEYWORDS: Optical lithography, Photomasks, Extreme ultraviolet lithography, Phase shifts, Line edge roughness, Line width roughness, Extreme ultraviolet, Stochastic processes, Critical dimension metrology, Molybdenum

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