Dr. Sebastian Heidenreich Profile

Dr. Sebastian Heidenreich

at Physikalisch Technische Bundesanstalt

SPIE Involvement:

Author

Proceedings Article | 23 August 2023 Presentation

Systematic influence of line edge roughness on the line width measured by scatterometry

Thomas Siefke, Sebastian Heidenreich

Proceedings Volume PC12619, PC1261906 (2023) https://doi.org/10.1117/12.2675801

KEYWORDS: Line edge roughness, Scatterometry, Scanning electron microscopy, Optical gratings, Metrology, Measurement uncertainty, Fabrication, Time metrology, Statistical analysis, Spectral density

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SPIE Journal Paper | 5 May 2020

Efficient Bayesian inversion for shape reconstruction of lithography masks

Nando Farchmin, Martin Hammerschmidt, Philipp-Immanuel Schneider, Matthias Wurm, Bernd Bodermann, Markus Bär, Sebastian Heidenreich

JM3, Vol. 19, Issue 02, 024001, (May 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.2.024001

KEYWORDS: Photomasks, Scatterometry, Lithography, Chaos, Inverse problems, Stochastic processes, Bayesian inference, Silicon, Error analysis, Oxides

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Proceedings Article | 20 March 2020 Paper

Sensitivity analysis for the detection of pitchwalk in self-aligned quadruple patterning by GISAXS

Maren Casfor Zapata, Nando Farchmin, Mika Pflüger, Konstantin Nikolaev, Victor Soltwisch, Sebastian Heidenreich, Christian Laubis, Michael Kolbe, Frank Scholze

Proceedings Volume 11325, 113251D (2020) https://doi.org/10.1117/12.2552037

KEYWORDS: Diffraction, Finite element methods, Scattering, Inverse problems, X-rays

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Proceedings Article | 21 June 2019 Presentation + Paper

Efficient global sensitivity analysis for silicon line gratings using polynomial chaos

Nando Farchmin, Martin Hammerschmidt, Philipp-Immanuel Schneider, Matthias Wurm, Bernd Bodermann, Markus Bär, Sebastian Heidenreich

Proceedings Volume 11057, 110570J (2019) https://doi.org/10.1117/12.2525978

KEYWORDS: Scatterometry, Polarization, Chaos, Silicon, Inverse problems, Systems modeling, Oxides, Photomasks, Scatter measurement, Data modeling

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Proceedings Article | 20 August 2015 Presentation + Paper

Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing

Emil Agocs, Bernd Bodermann, Sven Burger, Gaoliang Dai, Johannes Endres, Poul-Erik Hansen, Lars Nielson, Morten Madsen, Sebastian Heidenreich, Michael Krumrey, Bernd Loechel, Juergen Probst, Frank Scholze, Victor Soltwisch, Matthias Wurm

Proceedings Volume 9556, 955610 (2015) https://doi.org/10.1117/12.2190409

KEYWORDS: Scatterometry, Silicon, Standards development, Scanning electron microscopy, Atomic force microscopy, Manufacturing, Calibration, Metrology, Critical dimension metrology, X-rays

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Proceedings Article | 21 June 2015 Paper

The statistical inverse problem of scatterometry: Bayesian inference and the effect of different priors

Sebastian Heidenreich, Hermann Gross, Matthias Wurm, Bernd Bodermann, Markus Bär

Proceedings Volume 9526, 95260U (2015) https://doi.org/10.1117/12.2185707

KEYWORDS: Scatterometry, Inverse problems, Bayesian inference, Photomasks, Chaos, Atomic force microscopy, Scatter measurement, Finite element methods, Inverse optics, Metrology

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Proceedings Article | 1 May 2014 Paper

Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry

J. Endres, N. Kumar, P. Petrik, M. Henn, S. Heidenreich, S. Pereira, H. Urbach, B. Bodermann

Proceedings Volume 9132, 913208 (2014) https://doi.org/10.1117/12.2052819

KEYWORDS: Scatterometry, Deep ultraviolet, Diffraction, Oxides, Silicon, Scatter measurement, Polarization, Data modeling, Statistical analysis, Error analysis

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Proceedings Article | 13 May 2013 Paper

The effect of line roughness on DUV scatterometry

Mark-Alexander Henn, Sebastian Heidenreich, Hermann Gross, Bernd Bodermann, Markus Bär

Proceedings Volume 8789, 87890U (2013) https://doi.org/10.1117/12.2020761

KEYWORDS: Diffraction, Scatterometry, Extreme ultraviolet, Deep ultraviolet, Line edge roughness, Line width roughness, Finite element methods, Photomasks, Numerical simulations, Mathematical modeling

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Proceedings Article | 13 May 2013 Paper

Alternative methods for uncertainty evaluation in EUV scatterometry

Sebastian Heidenreich, Mark-Alexander Henn, Hermann Gross, Bernd Bodermann, Markus Bär

Proceedings Volume 8789, 87890T (2013) https://doi.org/10.1117/12.2020677

KEYWORDS: Data modeling, Scatterometry, Monte Carlo methods, Mathematical modeling, Extreme ultraviolet, Inverse problems, Photomasks, Scatter measurement, Inverse optics, Statistical modeling

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Proceedings Article | 18 December 2012 Paper

Impact of line edge and line width roughness on diffraction intensities in scatterometry

H. Gross, M.-A. Henn, S. Heidenreich, A. Rathsfeld, M. Bär

Proceedings Volume 8550, 85503R (2012) https://doi.org/10.1117/12.981327

KEYWORDS: Diffraction, Line width roughness, Line edge roughness, Extreme ultraviolet, Finite element methods, Scatterometry, Critical dimension metrology, Edge roughness, Optical testing, Cadmium

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Showing 5 of 10 publications

Conference Committee Involvement (1)

Modeling Aspects in Optical Metrology X

23 June 2025 | Munich, Germany

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