CONFERENCE PROCEEDINGS
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Ryosuke Ueba
at NuFlare Technology Inc
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Author
Publications (3)
Proceedings Article | 30 April 2023 Presentation
Curvilinear mask process correction with zero additional turnaround time
Noriaki Nakayamada, Haruyuki Nomura, Ryosuke Ueba, Yasuo Kato, Kenichi Yasui
Proceedings Volume 12495, 1249507 (2023) https://doi.org/10.1117/12.2658633
KEYWORDS: Photomasks, Vestigial sideband modulation, Raster graphics, Manufacturing, Electron beam lithography, Beam shaping
Proceedings Article | 16 October 2017 Paper
Multi-beam mask writer MBM-1000
Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Ryosuke Ueba, Kenji Otoshi, Hirokazu Yamada, Jin Choi, Byoung-Sup Ahn, Jong-Mun Park, Sang-Hee Lee, Shuichi Tamamushi, Chan-Uk Jeon
Proceedings Volume 10451, 1045117 (2017) https://doi.org/10.1117/12.2280502
KEYWORDS: Photomasks, Computer aided design, Data processing, Modulation
Proceedings Article | 13 July 2017 Paper
GPU-accelerated inline linearity correction: pixel-level dose correction (PLDC) for the MBM-1000
Harold Zable, Hironobu Matsumoto, Kenichi Yasui, Ryosuke Ueba, Noriaki Nakayamada, Nagesh Shirali, Yukihiro Masuda, Ryan Pearman, Aki Fujimura
Proceedings Volume 10454, 104540D (2017) https://doi.org/10.1117/12.2281922
KEYWORDS: Photomasks, Extreme ultraviolet, Point spread functions, Vestigial sideband modulation, Semiconducting wafers, Manufacturing, Nanoimprint lithography, Line edge roughness, Lithography, SRAF
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