CONFERENCE PROCEEDINGS
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Ryo Tsujimura
at Fujitsu Labs
SPIE Involvement:
Author
Publications (5)
SPIE Journal Paper | 7 August 2012
Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond
Yoshinori Kojima, Yasushi Takahashi, Masaki Takakuwa, Shuzo Ohshio, Shinji Sugatani, Ryo Tsujimura, Hiroshi Takita, Kozo Ogino, Hiromi Hoshino, Yoshio Ito, Masaaki Miyajima, Jun-ichi Kon
JM3, Vol. 11, Issue 3, 031403, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031403
KEYWORDS: Optical alignment, Electron beam direct write lithography, Electron beams, Overlay metrology, Control systems, Semiconducting wafers, Metals, Back end of line, Backscatter, Electron beam lithography
Proceedings Article | 21 March 2012 Paper
Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond
Yoshinori Kojima, Yasushi Takahashi, Masaki Takakuwa, Shuzo Ohshio, Shinji Sugatani, Ryo Tujimura, Hiroshi Takita, Kozo Ogino, Hiromi Hoshino, Yoshio Ito, Masaaki Miyajima, Jun-ichi Kon
Proceedings Volume 8323, 832326 (2012) https://doi.org/10.1117/12.916338
KEYWORDS: Electron beam direct write lithography, Optical alignment, Electron beams, Control systems, Semiconducting wafers, Overlay metrology, Metals, Photoresist processing, Backscatter, Electron beam lithography
Proceedings Article | 19 May 2011 Paper
Mask data processing technique using GPU for reducing computer cost
Ryo Tsujimura, Kozo Ogino, Hiromi Hoshino, Shigeo Satoh, Kazumasa Morishita, Satoshi Yoshikawa, Hiroki Futatsuya, Tatsuo Chijimatsu, Satoru Asai, Satoshi Yamauchi, Tomoyuki Okada, Naoyuki Ishiwata, Motoshu Miyajima
Proceedings Volume 8081, 80810I (2011) https://doi.org/10.1117/12.899496
KEYWORDS: Optical proximity correction, Data processing, Photomasks, Computing systems, Distributed computing, Manufacturing, Graphics processing units, Fourier transforms, Semiconductors, Digital image processing
Proceedings Article | 30 July 2002 Paper
Model-based OPC for phase-shifter edge lithography
Hiroki Futatsuya, Tatsuo Chijimatsu, Minami Takayoshi, Ryo Tsujimura, Yoshihisa Komura, Yoshio Ito, Satoru Asai
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474495
KEYWORDS: Optical proximity correction, Model-based design, Photomasks, Lithography, Phase shifts, Optics manufacturing, Etching, Computing systems, Semiconducting wafers, Critical dimension metrology
Proceedings Article | 25 August 1999 Paper
Development of a total CAD system for alternate-type PSMs with optical proximity correction
Tamae Haruki, Ryo Tsujimura, Junji Tomida, Yasuhide Machida, Satoru Asai, Isamu Hanyu
Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360194
KEYWORDS: Computer aided design, Optical proximity correction, Phase shifting, CAD systems, Parallel computing, X-ray technology, Amplifiers, Very large scale integration, Photomasks, X-rays
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