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Rose Marie Haynes
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Publications (1)
Proceedings Article | 20 March 2020 Presentation + Paper
EUV photoresist reference metrology using TEM tomography
Mark Biedrzycki, Umesh Adiga, Andrew Barnum, Alain Mousa, Jason Arjavac, Rose Marie Haynes, Anne-Laure Charley, Phillipe Leray, Dmitry Batuk
Proceedings Volume 11325, 113251T (2020) https://doi.org/10.1117/12.2552139
KEYWORDS: Transmission electron microscopy, Metrology, Tomography, Image segmentation, Photoresist materials, Atomic force microscopy, Extreme ultraviolet lithography, Semiconducting wafers, Atomic layer deposition, Image filtering
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