Robert Eklund
Product Manager at Mycronic AB
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 13 November 2024 Presentation
Robert Eklund, Mikael Wahlsten, Anders Svensson, Mats Rosling, Martin Glimtoft, Xueying Hai, Youngjin Park
Proceedings Volume 13216, 1321618 (2024) https://doi.org/10.1117/12.3034692
KEYWORDS: Semiconductor manufacturing, Semiconductor lasers, Manufacturing, Industry, Industrial applications, Design

Proceedings Article | 12 November 2024 Presentation + Paper
Martin Glimtoft, Robert Eklund, Mikael Wahlsten, Mats Rosling, Anders Svensson, Youngjin Park, Yukihiro Fujimura, Izumi Hotei, Mei Ebisawa, Yusuke Shoji, Shingo Yoshikawa
Proceedings Volume 13216, 132160L (2024) https://doi.org/10.1117/12.3034858
KEYWORDS: Photomasks, Deep ultraviolet, Printing, Design, Laser applications, Semiconductors, Industry, Semiconductor lasers, Semiconducting wafers, Scanning electron microscopy

Proceedings Article | 12 December 2023 Presentation + Paper
Christopher Leavitt, Michael Hunsweck, Florence Eschbach, Yang Liu, Kyle Vogt, Jun Kim, Andrew Sowers, Frank Abboud, Mikael Wahlsten, Robert Eklund, Mats Rosling, Peter Henriksson, Anders Svensson, Fredric Ihren, Youngjin Park
Proceedings Volume PC12751, PC127510T (2023) https://doi.org/10.1117/12.2688097
KEYWORDS: EUV optics, Laser applications, Extreme ultraviolet, Laser development, Critical dimension metrology, Sustainability, Solid state lasers, Solid state electronics, Printing, Power consumption

Proceedings Article | 22 November 2023 Presentation
Robert Eklund, Mikael Wahlsten, Mats Rosling, Martin Glimtoft, Peter Henriksson, Anders Svensson, Fredric Ihren, Youngjin Park
Proceedings Volume PC12751, PC127510H (2023) https://doi.org/10.1117/12.2687582
KEYWORDS: Laser development, Sustainability, Semiconductors, Semiconductor manufacturing, Manufacturing, Laser marking, Carbon

Proceedings Article | 26 September 2023 Presentation
Proceedings Volume PC12915, PC129150K (2023) https://doi.org/10.1117/12.3012449

Proceedings Article | 11 November 2022 Presentation
Proceedings Volume PC12293, PC122930J (2022) https://doi.org/10.1117/12.2641791
KEYWORDS: Photomasks, Deep ultraviolet, Semiconductors, Manufacturing, Electronics, Climate change, Agriculture

Proceedings Article | 12 October 2021 Presentation + Paper
Robert Eklund, Mats Rosling, Mikael Wahlsten, Martin Glimtoft, Göran Hansson, Anders Svensson, Youngjin Park
Proceedings Volume 11855, 1185511 (2021) https://doi.org/10.1117/12.2600939
KEYWORDS: Photomasks, Semiconductors, Laser applications, Semiconductor lasers, Manufacturing, Laser sources, Diagnostics, Deep ultraviolet, Solid state lighting, Modulation

Proceedings Article | 22 February 2021 Presentation
Mats Rosling, Mikael Wahlsten, Göran Hansson, Anders Svensson, Robert Eklund, Youngjin Park
Proceedings Volume 11613, 116130A (2021) https://doi.org/10.1117/12.2583601

Proceedings Article | 3 May 2007 Paper
Robert Eklund, Anders Österberg, Jonas Hellgren, Hans Fosshaug, Tord Karlin, Tom Newman
Proceedings Volume 6533, 65330C (2007) https://doi.org/10.1117/12.736923
KEYWORDS: Photomasks, Critical dimension metrology, Spatial light modulators, Convolution, Raster graphics, Neodymium, Electron beam lithography, Data modeling, Deep ultraviolet, Printing

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617359
KEYWORDS: Neodymium, Photomasks, Spatial light modulators, Deep ultraviolet, Electron beam lithography, Optical alignment, Quartz, Optical lithography, Chromium, Critical dimension metrology

Proceedings Article | 14 May 2004 Paper
Hans Fosshaug, Per Askebjer, Johan Karlsson, Adisa Bajramovic, Kezhao Xing, Robert Eklund, Jonathan Walford, Mats Ekberg, Peter Hogfeldt, Thomas Öström
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535821
KEYWORDS: Diffusion, Critical dimension metrology, Photomasks, Deep ultraviolet, Polymers, Printing, Spatial light modulators, Photoresist materials, Chemistry, Chemically amplified resists

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468622
KEYWORDS: Spatial light modulators, Photomasks, Critical dimension metrology, Micromirrors, Analog electronics, Deep ultraviolet, Mirrors, Image resolution, Manufacturing, Electron beam lithography

Showing 5 of 12 publications
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