Dr. Richard J. M. Anderson Profile

Dr. Richard J. M. Anderson

at Sandia National Labs California

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 6 May 2005 Paper

Investigation of plasma-induced erosion of multilayer condenser optics

Richard Anderson, Dean Buchenauer, K. Williams, W. M. Clift, L. Klebanoff, N. V. Edwards, O. Wood, S. Wurm

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599859

KEYWORDS: Ions, Xenon, Plasma, Silicon, Molybdenum, Sputter deposition, Carbon, Pulsed laser operation, Gold, Silicon carbide

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Proceedings Article | 20 May 2004 Paper

The erosion of materials exposed to a laser-pulsed-plasma (LPP) extreme ultraviolet (EUV) illumination source

Richard Anderson, Dean Buchenauer, Leonard Klebanoff, Obert Wood, Nora Edwards

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537852

KEYWORDS: Ions, Xenon, Plasma, Silicon, Extreme ultraviolet, Extreme ultraviolet lithography, Sputter deposition, Gold, Molybdenum, Particles

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Proceedings Article | 16 June 2003 Paper

System and process learning in a full-field high-power EUVL alpha tool

William Ballard, Daniel Tichenor, Donna O'Connell, Luis Bernardez, Robert Lafon, Richard Anderson, Alvin Leung, Kenneth Williams, Steven Haney, Yon Perras, Karen Jefferson, Therese Porter, Daniel Knight, Pamela Barr, James Van de Vreugde, Richard Campiotti, Mark Zimmerman, Terry Johnson, Leonard Klebanoff, Philip Grunow, Samuel Graham, Dean Buchenauer, William Replogle, Tony Smith, John Wronosky, Joel Darnold, Kenneth Blaedel, Henry Chapman, John Taylor, Layton Hale, Gary Sommargren, Eric Gullikson, Patrick Naulleau, Kenneth Goldberg, Sang Hun Lee, Harry Shields, Randall St. Pierre, Samuel Ponti

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482791

KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet, Sensors, Extreme ultraviolet lithography, Lithography, Projection systems, Xenon, EUV optics, Fiber optic illuminators

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Proceedings Article | 1 July 2002 Paper

High-power laser-produced-plasma EUV source

William Ballard, Luis Bernardez, Robert Lafon, Richard Anderson, Yon Perras, Alvin Leung, Harry Shields, Michael Petach, Randall St. Pierre, Robert Bristol

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472303

KEYWORDS: Extreme ultraviolet, Xenon, Liquids, Plasma, Lithography, Extreme ultraviolet lithography, Mirrors, High power lasers, Laser energy, Sensors

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Proceedings Article | 26 August 1999 Paper

Modular telerobot control system for accident response

Richard Anderson, David Shirey

Proceedings Volume 3839, (1999) https://doi.org/10.1117/12.360342

KEYWORDS: Cameras, Control systems, Human-machine interfaces, Prototyping, Video, Imaging systems, Sensors, Robotics, Switching, Visualization

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Proceedings Article | 7 July 1997 Paper

Optical characterization of the internal electric field distribution under bias of CdZnTe radiation detectors

H. Walter Yao, Richard Anderson, Ralph James

Proceedings Volume 3115, (1997) https://doi.org/10.1117/12.277705

KEYWORDS: Sensors, Electric field sensors, Crystals, Electro optics, Electro optical modeling, Polarizers, Charge-coupled devices, CCD image sensors, Radiation effects, Linear polarizers

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Proceedings Article | 1 April 1990 Paper

Ultrafast optical processes in mercuric iodide

Leah Williams, Richard Anderson

Proceedings Volume 1209, (1990) https://doi.org/10.1117/12.17905

KEYWORDS: Picosecond phenomena, Absorption, Refraction, Femtosecond phenomena, Diffraction, Crystals, Phonons, Ultrafast phenomena, Raman spectroscopy, Spectroscopy

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Showing 5 of 7 publications

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