Mr. Rajiv Naresh Sejpal Profile

Rajiv Naresh Sejpal

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Publications (8)

Proceedings Article | 28 April 2023 Presentation + Paper

Defining Tatian-Zernike polynomials for use in a lithography simulator

W. Ethan Maguire, Rajiv Sejpal, Bruce Smith

Proceedings Volume 12494, 124940P (2023) https://doi.org/10.1117/12.2660861

KEYWORDS: Wavefronts, Wavefront errors, Lenses, Lithography, Zernike polynomials, Singular value decomposition, Monochromatic aberrations, Simulations, Wavefront aberrations, Optical aberrations

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Proceedings Article | 28 April 2023 Presentation + Paper

Modeling and verification of next-gen EUV mask absorbers

Rajiv Sejpal, William Maguire, Bruce Smith

Proceedings Volume 12494, 124940H (2023) https://doi.org/10.1117/12.2660823

KEYWORDS: Refractive index, Systems modeling, Extreme ultraviolet, Phase shifts, Composites, Modeling, Dielectrics, Phase shifting, Lithography, EUV optics, 3D mask effects

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Proceedings Article | 28 April 2023 Paper

Modelling of patterning impact from diffraction hot spots in high-NA EUV lenses

Ethan Maguire, Rajiv Sejpal, Bruce Smith

Proceedings Volume 12494, 124941E (2023) https://doi.org/10.1117/12.2658756

KEYWORDS: Diffraction, Extreme ultraviolet, Modeling, Systems modeling, Lenses, Diffusion, Reflectivity, Source mask optimization, Optical lithography, Nanoimprint lithography

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Proceedings Article | 26 May 2022 Paper

Characterizing EMA modelled EUV absorbers for high reflectivity: high phase performance

Rajiv Sejpal, Bruce Smith

Proceedings Volume 12051, 120510E (2022) https://doi.org/10.1117/12.2617589

KEYWORDS: Reflectivity, Nickel, Photomasks, Dielectrics, Molybdenum, Extreme ultraviolet lithography, Refractive index, Multilayers

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Proceedings Article | 12 October 2021 Presentation + Paper

EMA modelled alternative EUV absorber materials considering optical and stability behavior

Rajiv Sejpal, Bruce Smith

Proceedings Volume 11855, 118550G (2021) https://doi.org/10.1117/12.2600735

KEYWORDS: Reflectivity, Photomasks, Rhodium, Refractive index, Phase shifts, Dielectrics, Phase shifting, Extreme ultraviolet, Stochastic processes

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Proceedings Article | 20 March 2020 Presentation + Paper

Realizing more accurate OPC models by utilizing SEM contours

Chih-I Wei, Rajiv Sejpal, Yunfei Deng, Ir Kusnadi, Germain Fenger, Masahiro Oya, Yosuke Okamoto, Kotaro Maruyama, Yuichiro Yamazaki, Sayantan Das, Sandip Halder, Werner Gillijns

Proceedings Volume 11325, 1132524 (2020) https://doi.org/10.1117/12.2554527

KEYWORDS: Scanning electron microscopy, Data modeling, Calibration, Optical proximity correction, Semiconducting wafers, Metrology, Image processing, 3D modeling, Photomasks, Image quality

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Proceedings Article | 26 September 2019 Paper

Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers

Rajiv Sejpal, Vicky Philipsen, Ana Armeanu, Chih-I Wei, Werner Gillijns, Neal Lafferty, Germain Fenger, Eric Hendrickx

Proceedings Volume 11148, 111481B (2019) https://doi.org/10.1117/12.2536892

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Source mask optimization, Nanoimprint lithography, SRAF, Optical proximity correction, Phase shifting, Logic

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Proceedings Article | 21 March 2019 Paper

SALELE process from theory to fabrication

Youssef Drissi, Werner Gillijns, Jae Uk Lee, Ryan Ryoung han Kim , Ahmed Hamed-Fatehy, Rehab Kotb, Rajiv Naresh Sejpal, Germain Fenger, James Word

Proceedings Volume 10962, 109620V (2019) https://doi.org/10.1117/12.2517051

KEYWORDS: Manufacturing, Optical proximity correction, Extreme ultraviolet, Metals, Photomasks, Visualization, Scanning electron microscopy, Printing, Metrology, Optical lithography

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Showing 5 of 8 publications

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