Dr. Petros Thomas Profile

Dr. Petros Thomas

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Publications (5)

Proceedings Article | 8 April 2011 Paper

Dependence of contamination rates on key parameters in EUV optics

Yashdeep Khopkar, Petros Thomas, Leonid Yankulin, Rashi Garg, Chimaobi Mbanaso, Alin Antohe, Mihir Upadhyaya, Vimal Kumar Kamineni, Yu-Jen Fan, Gregory Denbeaux, Vibhu Jindal, Andrea Wüest, Eric Gullikson

Proceedings Volume 7969, 796923 (2011) https://doi.org/10.1117/12.879491

KEYWORDS: Contamination, Carbon, Extreme ultraviolet, Ruthenium, EUV optics, Polymers, Polymerization, Polymer thin films, Mirrors, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2010 Paper

Wavelength dependence of carbon contamination on mirrors with different capping layers

Petros Thomas, Leonid Yankulin, Yashdeep Khopkar, Rashi Garg, Chimaobi Mbanaso, Alin Antohe, Yu-Jen Fan, Gregory Denbeaux, Samir Aouadi, Vibhu Jindal, Andrea Wüest

Proceedings Volume 7636, 76361X (2010) https://doi.org/10.1117/12.847015

KEYWORDS: Contamination, Extreme ultraviolet, Carbon, Mirrors, Extreme ultraviolet lithography, Xenon, Error analysis, Neodymium, Ruthenium, Titanium dioxide

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Proceedings Article | 20 March 2010 Paper

Carbon contamination topography analysis of EUV masks

Yu-Jen Fan, Leonid Yankulin, Petros Thomas, Chimaobi Mbanaso, Alin Antohe, Rashi Garg, Yunfei Wang, Thomas Murray, Andrea Wüest, Frank Goodwin, Sungmin Huh, Aaron Cordes, Patrick Naulleau, Kenneth Goldberg, Iacopo Mochi, Eric Gullikson, Gregory Denbeaux

Proceedings Volume 7636, 76360G (2010) https://doi.org/10.1117/12.846996

KEYWORDS: Carbon, Contamination, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectivity, Printing, Scanning electron microscopy, Inspection, Lithography

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Proceedings Article | 18 March 2009 Paper

Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging

Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Rashi Garg, Petros Thomas, Chimaobi Mbanaso, Andrea Wüest, Frank Goodwin, Sungmin Huh, Patrick Naulleau, Kenneth Goldberg, Iacopo Mochi, Gregory Denbeaux

Proceedings Volume 7271, 72713U (2009) https://doi.org/10.1117/12.814196

KEYWORDS: Photomasks, Contamination, Carbon, Extreme ultraviolet, Scanning electron microscopy, Printing, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Reflectivity

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Proceedings Article | 18 March 2009 Paper

EUV resist outgassing: scaling to HVM intensity

Alin Antohe, Chimaobi Mbanaso, Yu-Jen Fan, Leonid Yankulin, Rashi Garg, Petros Thomas, Gregory Denbeaux, Emil Piscani, Andrea Wuest

Proceedings Volume 7271, 727126 (2009) https://doi.org/10.1117/12.816555

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Molecules, Photoresist materials, Polymethylmethacrylate, Spectroscopy, Semiconducting wafers, Polymers, EUV optics, Photons

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