Mr. Peter Högfeldt Profile

Peter Högfeldt

Director Product Marketing at Micronic Laser Systems AB

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 28 June 2005 Paper

High performance FEP-171 resist process in combination with NTAR7 and NTAR5 chrome and the Sigma7300 DUV mask writer

Kezhao Xing, Johan Karlsson, Adisa Paulson, Charles Bjornberg, Axel Lundvall, Peter Hogfeldt, Jukka Vedenpaa, Robin Goodoree, Mans Bjuggren

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617056

KEYWORDS: Photomasks, Diffractive optical elements, Lithography, Binary data, Deep ultraviolet, Etching, Critical dimension metrology, Standards development, Vestigial sideband modulation, Photoresist processing

Read Abstract +

Proceedings Article | 16 June 2005 Paper

Second level exposure for advanced phase shift mask applications using the SLM-based Sigma7300 DUV mask writer

Thomas Ostrom, Angela Beyerl, Henrik Sjoberg, Tom Newman, Peter Hogfeldt

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637276

KEYWORDS: Photomasks, Optical alignment, Deep ultraviolet, Spatial light modulators, Electron beam lithography, Optical lithography, Overlay metrology, Charge-coupled devices, Quartz, CCD cameras

Read Abstract +

Proceedings Article | 6 December 2004 Paper

FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator

Johan Karlsson, Kezhao Xing, Adisa Bajramovic, Henrik Dahlberg, Charles Bjornberg, Peter Hogfeldt, Lars Kjellberg, Hans Fosshaug, Anna Dahlberg, Axel Lundvall

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569653

KEYWORDS: Etching, Dry etching, Photomasks, Diffractive optical elements, Reactive ion etching, Deep ultraviolet, Photoresist processing, Lithography, Image resolution, Manufacturing

Read Abstract +

Proceedings Article | 20 August 2004 Paper

Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator

Henrik Sjoberg, Jean-Michel Chauvet, Jan Harkesjo, Peter Hogfeldt, Andrzej Karawajczyk, Johan Karlsson, Lars Kjellberg, Jonas Mahlen, Angela Beyerl, Jukka Vedenpaa, Robin Goodoree, Mans Bjuggren, Johan Aman

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557805

KEYWORDS: Photomasks, Spatial light modulators, Manufacturing, Deep ultraviolet, Printing, Raster graphics, Laser applications, Lithography, Image processing, Solids

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Influence of writing strategy on CD control for the spatial light modulator-based Sigma7300 DUV laser pattern generator

Hans Fosshaug, Per Askebjer, Johan Karlsson, Adisa Bajramovic, Kezhao Xing, Robert Eklund, Jonathan Walford, Mats Ekberg, Peter Hogfeldt, Thomas Öström

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535821

KEYWORDS: Diffusion, Critical dimension metrology, Photomasks, Deep ultraviolet, Polymers, Printing, Spatial light modulators, Photoresist materials, Chemistry, Chemically amplified resists

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes

Johan Aman, Hans Fosshaug, Tobias Hedqvist, Jan Harkesjo, Peter Hogfeldt, Marie Jacobsson, Andrzej Karawajczyk, Johan Karlsson, Mats Rosling, Henrik Sjoberg

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.519970

KEYWORDS: Spatial light modulators, Deep ultraviolet, Photomasks, Laser applications, Excimer lasers, Electron beams, Optical proximity correction, Coherence imaging, Electronics, Particles

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years