Resonance domain diffraction gratings with local periods near the wavelength may have very high diffraction efficiencies. Unfortunately, they are difficult to fabricate, especially for use with light in visible and shorter wavelengths. We present several methods for fabricating surface relief resonance domain diffraction gratings used in the visible spectral region. We also optimize the relevant fabrication parameters and compare the resulting performance for each method. For the fabrication, we resort to e-beam lithography and reactive ion etching. Characterization is performed with environmental scanning electron microscopy, atomic force microscopy, and optical measurements on representative structures. Nearly 100% Bragg diffraction efficiency can be achieved with transmission resonance domain binary gratings formed in fused silica and having a period of 0.5 μm and a groove depth of 1 μm.
Structuring of optical surfaces with surface-relief diffractive optical elements is an enabling technology for achieving
considerable spatially varying changes in light propagation direction and wavefront curvature. This way, Bragg effects,
angular and spectral selectivity and nearly 100% diffraction efficiency usually attributed to volume optical holograms
can be achieved by surface relief computer generated holograms and diffractive optical elements. Several methods for
fabricating deep "resonance domain" diffraction structures with periods, exceeding the subwavelength limit but near to
the wavelength, were compared and optimized. Results of direct e-beam writing RIE etching, SEM and AFM
measurements for fused silica gratings with period of 520 nm and groove depth of 1000 nm, designed for nearly 100%
diffraction efficiency in the green 532 nm laser light, are presented.
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