Unspecified Noriyuki Miura Profile

Noriyuki Miura

at Osaka Univ.

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 10 April 2024 Presentation + Paper

Utilization of active contour model with 3D-SEM simulation for see-through BSE image of high voltage SEM

Masahiro Oya, Yosuke Okamoto, Shinichi Nakazawa, Kotaro Maruyama, Yuichiro Yamazaki, Shinji Murakami, Yoshihiro Midoh, Noriyuki Miura

Proceedings Volume 12955, 129550R (2024) https://doi.org/10.1117/12.3011075

KEYWORDS: Contour extraction, Overlay metrology, Contour modeling, Monte Carlo methods, Image analysis, Scanning electron microscopy, Computer aided design

Read Abstract +

As semiconductor device structures continue to shrink and increase its complexity, the need for precise measurement techniques extends beyond single-layer patterning to encompass overlay and Edge Placement Error (EPE) across multiple layers. Traditionally, overlay and EPE have been managed using dedicated patterns and equipment, respectively. However, as manufacturing processes become more intricate, there arises a necessity to measure these parameters directly on actual device patterns. Addressing this demand, High Voltage-Scanning Electron Microscopy (HV-SEM) emerges as a viable tool for on-device-overlay measurement. Nevertheless, challenges persist in achieving accurate measurements using seethrough Backscattered Electron (BSE) imaging due to low contrast and sharpness resulting from electron diffusion through upper-layer patterns. This impedes precise contour extraction and reduces pattern measurement sensitivity. Moreover, in layouts where pattern contours between layers are closely spaced, precise contour extraction becomes even more challenging. To address these issues, a specialized contour extraction function is essential for achieving precise and stable pattern extraction from BSE images. In this paper, we propose a novel HV-SEM overlay measurement methodology utilizing active contour model with Electron Beam (EB) simulation. Synthetic images, designed to emulate the latest device structures and based on BSE features obtained through EB simulation, were employed for evaluation. The results demonstrate the method's robustness to noise and its ability to accurately extract the contours of partially hidden lowerlayer patterns. The proposed approach will enhance the accuracy of HV-SEM overlay measurements, thereby expanding the utility of HV-SEM see-through BSE imaging in semiconductor manufacturing processes.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years