Mr. Nobuyuki Takahashi Profile

Nobuyuki Takahashi

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 13 June 2022 Presentation

Highly selective isotropic chemical dry etching for gate-all-around devices: nanosheet, forksheet and complementary FETs

Yusuke Muraki, Yusuke Oniki, Pallavi Gowda, Efrain Altamirano-Sánchez, Hans Mertens, Naoto Horiguchi, Frank Holsteyns, Subhadeep Kal, Cheryl Alix, Kaushik Kumar, Aelan Mosden, Trace Hurd, Nobuyuki Takahashi

Proceedings Volume PC12056, PC1205604 (2022) https://doi.org/10.1117/12.2613723

KEYWORDS: Field effect transistors, Etching, Dry etching, Very large scale integration, Isotropic etching, Dielectrics, Gallium arsenide, Transistors, Superlattices, Sodium

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years