Dr. Nicola N. Kissoon Profile

Dr. Nicola N. Kissoon

at ASML BVBA

SPIE Involvement:

Author

Publications (4)

SPIE Journal Paper | 25 September 2024

Actinic inspection of the extreme ultraviolet optical parameters of lithographic materials enabled by a table-top, coherent extreme ultraviolet source

Kevin Dorney, Fabian Holzmeier, Nicola Kissoon, Esben Larsen, Dhirendra Singh, Shikhar Arvind, Sayantani Santra, Roberto Fallica, Marina Timmermans, Ivan Pollentier, Igor Makhotkin, Vicky Philipsen, Stefan De Gendt, Claudia Fleischmann, Paul A. van der Heide, John Petersen

JM3, Vol. 23, Issue 04, 041406, (September 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.041406

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Reflectivity, Ruthenium, Pellicles, EUV optics, Reflectometry, Optical properties, Systems modeling

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Proceedings Article | 10 April 2024 Presentation + Paper

Machine learning methods for voltage contrast yield analysis

D. Cerbu, V. Blanco Carballo, F. Schleicher, J. van de Kerkhove, P. Leray, N. Kissoon, E. De Poortere

Proceedings Volume 12955, 129551C (2024) https://doi.org/10.1117/12.3011142

KEYWORDS: Semiconducting wafers, Machine learning, Image processing, Design, Scanning electron microscopy

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Proceedings Article | 28 April 2023 Presentation + Paper

Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry

Kevin Dorney, Nicola Kissoon, Fabian Holzmeier, Esben Larsen, Dhirendra Singh, Shikhar Arvind, Sayantani Santra, Roberto Fallica, Igor Makhotkin, Vicky Philipsen, Stefan De Gendt, Claudia Fleischmann, Paul A. van der Heide, John Petersen

Proceedings Volume 12494, 1249407 (2023) https://doi.org/10.1117/12.2658359

KEYWORDS: Extreme ultraviolet, Photoresist materials, Reflectometry, Extreme ultraviolet lithography, Optical constants, Interfaces

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Proceedings Article | 12 October 2021 Poster + Presentation + Paper

iN5 EUV single expose patterning evaluation for via layers

Argho Das, Victor Blanco, Sayantan Das, Nicola Kissoon, Sandip Halder, Mircea Dusa

Proceedings Volume 11854, 1185418 (2021) https://doi.org/10.1117/12.2600938

KEYWORDS: Etching, Logic, Critical dimension metrology, Inspection, Extreme ultraviolet lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Metrology, Diffractive optical elements

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