Dr. Nick A. Stacey Profile

Dr. Nick A. Stacey

Global Laboratory Manager at 3M Co

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 19 May 2008 Paper

32 nm imprint masks using variable shape beam pattern generators

Kosta Selinidis, Ecron Thompson, Gerard Schmid, Nick Stacey, Joseph Perez, John Maltabes, Douglas Resnick, Jeongho Yeo, Hoyeon Kim, Ben Eynon

Proceedings Volume 7028, 70280R (2008) https://doi.org/10.1117/12.793034

KEYWORDS: Semiconducting wafers, Line width roughness, Lithography, Etching, Photomasks, Critical dimension metrology, Beam shaping, Overlay metrology, Manufacturing, Line edge roughness

Read Abstract +

Proceedings Article | 23 January 2006 Paper

Fabrication of nano and micro optical elements by step and flash imprint lithography

Niyaz Khusnatdinov, Gary Doyle, Mike Miller, Nick Stacey, Mike Watts, Dwayne LaBrake

Proceedings Volume 6110, 61100K (2006) https://doi.org/10.1117/12.647301

KEYWORDS: Lenses, Etching, Lithography, Polarizers, Aluminum, Optical lithography, Optical components, Fabrication, Photoresist processing, Semiconducting wafers

Read Abstract +

The Step and Flash Imprint Lithography (S-FIL^TM) process is a step and repeat nano-imprint lithography (NIL) technique based on UV curable low viscosity liquids.^1,2,3Investigation by this group and others has shown that the resolution of replication by imprint lithography is limited only by the size of the structures that can be created on the template (mold). S-FIL uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning. This approach allows for micro and nano-fabrication of devices with widely varying pattern densities and complicated structures. Wire grid polarizers and micro lenses are two examples for optical components that can be formed using SFIL technology. Step and Flash Imprint Lithography Reverse (S-FIL/R) tone has been used to form resist patterns for a number of different device types ^1,4,6. The authors have employed S-FIL/R and dry develop techniques to form resist patterns with 100 nm period useful for the fabrication of wire grid polarizers. S-FIL/R has a number of advantages over interference lithography techniques for the fabrication of sub 200 nm period grating structures including but no limited to pattern repeatability, vibration insensitivity, high aspect ratio feature formation, greater extendibility and high resolution. The authors have devised imprint and dry etching processes for resist and substrate patterning to form Al based wire grid polarizers with 100 nm pitch. The fabrication processes and resulting devises will be described. While S-FIL is useful for in the formation of resist patterned wafers, it is also capable of forming devices by functional material patterning. Polymer micro lenses are a good examples of functional material devices useful for a number of applications including CMOS and CCD cameras. The fact that lens geometry is defined by the template and requires no post imprint processing provides a strong advantage over current lens formation approaches. Recent results and the state of current micro lens fabrication by S-FIL is described.

Proceedings Article | 6 May 2005 Paper

Fabrication of nanometer sized features on non-flat substrates using a nano-imprint lithography process

Mike Miller, Gary Doyle, Nick Stacey, Frank Xu, S. Sreenivasan, Mike Watts, Dwayne LaBrake

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.607340

KEYWORDS: Semiconducting wafers, Etching, Lithography, Polishing, Nanoimprint lithography, Silicon, Photomicroscopy, Optical lithography, Scanning electron microscopy, Nanolithography

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Mesoscale modeling for SFIL simulating polymerization kinetics and densification

Ryan Burns, Stephen Johnson, Gerard Schmid, Eui Kim, Michael Dickey, Jason Meiring, Sean Burns, Nicholas Stacey, C. Grant Willson, Diana Convey, Yi Wei, Peter Fejes, Kathleen Gehoski, David Mancini, Kevin Nordquist, William Dauksher, Douglas Resnick

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536216

KEYWORDS: Etching, Polymerization, Molecules, Monte Carlo methods, Finite element methods, Lithography, Ultraviolet radiation, Molecular interactions, Scanning electron microscopy, Optical lithography

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Development of imprint materials for the Step and Flash Imprint Lithography process

Frank Xu, Nicholas Stacey, Mike Watts, Van Truskett, Ian McMackin, Jin Choi, Philip Schumaker, Ecron Thompson, Daniel Babbs, S. Sreenivasan, C. Grant Willson, Norman Schumaker

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538734

KEYWORDS: Lithography, Ultraviolet radiation, Silicon, Optical lithography, Liquids, Semiconducting wafers, Etching, Optical alignment, Scanning electron microscopy, Interfaces

Read Abstract +

Proceedings Article | 16 June 2003 Open Access

Imprint lithography: lab curiosity or the real NGL

Douglas Resnick, William Dauksher, David Mancini, Kevin Nordquist, Todd Bailey, Stephen Johnson, Nicholas Stacey, John Ekerdt, C. Grant Willson, S. Sreenivasan, Norman Schumaker

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490126

KEYWORDS: Etching, Lithography, Semiconducting wafers, Silicon, Nanoimprint lithography, Chromium, Optical alignment, Image processing, Oxides, Inspection

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 16 June 2003 Paper

Advances in Step and Flash imprint lithography

Stephen Johnson, Todd Bailey, Michael Dickey, Britain Smith, Eunha Kim, Andrew Jamieson, Nicholas Stacey, John Ekerdt, C. Grant Willson, David Mancini, William Dauksher, Kevin Nordquist, Douglas Resnick

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484985

KEYWORDS: Etching, Oxygen, Lithography, Polymerization, Silicon, Data modeling, Semiconducting wafers, Statistical analysis, Inspection, Materials processing

Read Abstract +

Proceedings Article | 16 June 2003 Paper

Employing Step and Flash imprint lithography for gate-level patterning of a MOSFET device

Britain Smith, Nicholas Stacey, J. Donnelly, David Onsongo, Todd Bailey, Chris Mackay, Douglas Resnick, William Dauksher, David Mancini, Kevin Nordquist, S. Sreenivasan, Sanjay Banerjee, John Ekerdt, Grant Willson

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490142

KEYWORDS: Etching, Lithography, Field effect transistors, Optical alignment, Semiconducting wafers, Optical lithography, Photomasks, Oxides, Reactive ion etching, Halogens

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years