Dr. Nadir S. Faradzhev Profile

Dr. Nadir S. Faradzhev

at National Institute of Standards and Technology

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Author

Publications (6)

Proceedings Article | 1 April 2013 Paper

Effects of varying the parameters in witness-sample-based photoresist outgas testing: dependence of the carbon growth on pumping speed and the dose, time, and area of resist exposure

C. Tarrio, R. Berg, S. Hill, S. Grantham, N. Faradzhev, T. Lucatorto

Proceedings Volume 8679, 867920 (2013) https://doi.org/10.1117/12.2011663

KEYWORDS: Semiconducting wafers, Carbon, Extreme ultraviolet, Contamination, Photoresist materials, Extreme ultraviolet lithography, Mirrors, Molecules, Manufacturing, Scanners

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Proceedings Article | 26 March 2011 Paper

Optics contamination studies in support of high-throughput EUV lithography tools

S. Hill, N. Faradzhev, L. Richter, S. Grantham, C. Tarrio, T. Lucatorto, S. Yulin, M. Schürmann, V. Nesterenko, T. Feigl

Proceedings Volume 7969, 79690M (2011) https://doi.org/10.1117/12.879852

KEYWORDS: Contamination, Extreme ultraviolet lithography, Extreme ultraviolet, EUV optics, Carbon, Molecules, Synchrotrons, Mirrors, Ruthenium, Spectroscopic ellipsometry

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Proceedings Article | 23 March 2010 Paper

A simple null-field ellipsometric imaging system (NEIS) for in-situ monitoring of EUV-induced deposition on EUV optics

Rashi Garg, Nadir Faradzhev, Shannon Hill, Lee Richter, P. S. Shaw, R. Vest, T. Lucatorto

Proceedings Volume 7636, 76361Z (2010) https://doi.org/10.1117/12.855967

KEYWORDS: Carbon, EUV optics, Imaging systems, Extreme ultraviolet, Extreme ultraviolet lithography, Dielectrics, Polarizers, Ellipsometry, Contamination, Thin films

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Proceedings Article | 20 March 2010 Paper

Complex species and pressure dependence of intensity scaling laws for contamination rates of EUV optics determined by XPS and ellipsometry

S. Hill, N. Faradzhev, L. Richter, T. Lucatorto

Proceedings Volume 7636, 76360E (2010) https://doi.org/10.1117/12.846849

KEYWORDS: Contamination, Extreme ultraviolet lithography, Carbon, Molecules, Extreme ultraviolet, Protactinium, EUV optics, Adsorption, Synchrotrons, Electrons

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Proceedings Article | 18 March 2009 Paper

Measuring the EUV-induced contamination rates of TiO2-capped multilayer optics by anticipated production-environment hydrocarbons

S. Hill, N. Faradzhev, C. Tarrio, T. Lucatorto, R. Bartynski, B. Yakshinskiy, T. Madey

Proceedings Volume 7271, 727113 (2009) https://doi.org/10.1117/12.814111

KEYWORDS: Contamination, Extreme ultraviolet lithography, Protactinium, Molecules, Extreme ultraviolet, Reflectivity, Carbon, Synchrotrons, Molecular interactions, Titanium dioxide

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Proceedings Article | 20 March 2008 Paper

Accelerated lifetime metrology of EUV multilayer mirrors in hydrocarbon environments

S. Hill, N. Faradzhev, C. Tarrio, T. Lucatorto, T. Madey, B. Yakshinskiy, E. Loginova, S. Yulin

Proceedings Volume 6921, 692117 (2008) https://doi.org/10.1117/12.772627

KEYWORDS: Reflectivity, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Carbon, Ruthenium, Reflectometry, Solids, Molecules, Oxidation

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Showing 5 of 6 publications

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