Dr. Mosong Cheng Profile

Dr. Mosong Cheng

at ASML

SPIE Involvement:

Author

Publications (20)

Proceedings Article | 21 March 2007 Paper

Wire sizing and spacing for lithographic printability optimization

Ke Cao, Jiang Hu, Mosong Cheng

Proceedings Volume 6521, 652111 (2007) https://doi.org/10.1117/12.708974

KEYWORDS: Lithography, Resolution enhancement technologies, Photomasks, Optical proximity correction, Semiconducting wafers, Silicon, Image segmentation, Very large scale integration, Optimization (mathematics), Diffraction

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SPIE Journal Paper | 1 July 2005

Characterizing positive chemically amplified resists via in-situ impedance monitoring

Chao Liu, Mosong Cheng

JM3, Vol. 4, Issue 03, 033001, (July 2005) https://doi.org/10.1117/12.10.1117/1.2037407

KEYWORDS: Diffusion, Polymers, Chemically amplified resists, Capacitance, Semiconducting wafers, Resistance, Dielectrics, Chemical analysis, Mathematical modeling, Capacitors

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Proceedings Article | 23 May 2005 Paper

Physics behind the new technique "Sensing of phage-triggered ion cascades" (SEPTIC) for the prompt identification of bacteria

L. Kish, Sergey Bezrukov, A. Der, M. Cheng, M. King, R. Young, S. Seo, J. Kim

Proceedings Volume 5846, (2005) https://doi.org/10.1117/12.610671

KEYWORDS: Bacteria, Ions, Physics, Injuries, Mirrors, Clouds, Sensors, Diffusion, Linear filtering, Biology

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Proceedings Article | 23 May 2005 Paper

Nano device for monitoring electrical fluctuations on bacterial scale

Sungkyu Seo, Jong Kim, Maria Dobozi-King, Ryland Young, Sergey Bezrukov, Laszlo Kish, Mosong Cheng

Proceedings Volume 5844, (2005) https://doi.org/10.1117/12.611244

KEYWORDS: Bacteria, Ions, Sensors, Field effect transistors, Signal detection, Polymethylmethacrylate, Solid state electronics, Electron beam lithography, Molecules, Microfluidics

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Proceedings Article | 23 May 2005 Paper

Nanoscale detection of bacteriophage triggered ion cascade

Maria Dobozi-King, Sungkyu Seo, Jong Kim, Mosong Cheng, Laszlo Kish, Ryland Young

Proceedings Volume 5841, (2005) https://doi.org/10.1117/12.611050

KEYWORDS: Bacteria, Ions, Bridges, Stochastic processes, Diagnostics, Molecular bridges, Pathogens, Adsorption, Amplifiers, Field effect transistors

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Proceedings Article | 28 May 2004 Paper

Optical coupling of lens, liquid and resist in immersion lithography: rigorous model and assessment

MoSong Cheng, Benjamin Ho, Richard Yamaguchi, Kazutoshi Yoshioka, Hidetami Yaegashi

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537443

KEYWORDS: Liquids, 3D modeling, Polarization, Photomasks, Immersion lithography, Image quality, Lithographic illumination, Lithography, Water, Light

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Proceedings Article | 3 May 2004 Paper

Layout modification for library cell Alt-PSM composability

Ke Cao, Jiang Hu, Mosong Cheng

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.538900

KEYWORDS: Computer aided design, Photomasks, Phase shifts, Phase shifting, Resolution enhancement technologies, Silicon, Lithography, Optical proximity correction, Solids, Optical lithography

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Proceedings Article | 26 June 2003 Paper

The impact of mask topography and resist effects on optical proximity correction in advanced alternating phase-shift process

Mosong Cheng, Benjamin Ho, Doug Guenther

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485508

KEYWORDS: Photomasks, Polarization, Photoresist processing, Critical dimension metrology, Scanning electron microscopy, Optical lithography, Process modeling, Spatial frequencies, Semiconducting wafers, Image processing

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Proceedings Article | 26 June 2003 Paper

Simulation of sub-90-nm node complementary phase-shift processes with ArF lithography

Mosong Cheng, Benjamin Ho, Kathleen Nafus

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485443

KEYWORDS: Critical dimension metrology, Photomasks, Optical proximity correction, Lithography, Printing, Electroluminescence, 193nm lithography, Cadmium, Scanners, Image processing

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Proceedings Article | 12 June 2003 Paper

Line-edge roughness (LER) optimization on 300-mm DUV alternating phase shift (altPSM) processes

Benjamin Ho, Doug Guenther, Mosong Cheng, Ken Sotoodeh, Anne Rudack, Richard Yamaguchi, Bob Brown, Marcus Ickes, Kathleen Nafus

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483710

KEYWORDS: Line edge roughness, Etching, Photoresist processing, Critical dimension metrology, Monte Carlo methods, Phase shifts, Plasma etching, Photomasks, Deep ultraviolet, Semiconducting wafers

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Proceedings Article | 30 July 2002 Paper

Effects of residual aberrations on line-end shortening in 193-nm lithography

Mosong Cheng, Andrew Neureuther

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474526

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Cadmium, Scanning electron microscopy, Optical proximity correction, 193nm lithography, Lithography, Calibration, Printing

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Proceedings Article | 30 July 2002 Paper

OPC rectification of random space patterns in 193-nm lithography

Mosong Cheng, Andrew Neureuther, Keeho Kim, Z. Mark Ma, Won Kim, Maureen Hanratty

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474512

KEYWORDS: Optical proximity correction, Critical dimension metrology, Cadmium sulfide, Scanning electron microscopy, Process modeling, Photomasks, Printing, Lithography, Calibration, 193nm lithography

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Proceedings Article | 14 September 2001 Paper

LAVA web-based remote simulation: enhancements for education and technology innovation

Sang Il Lee, Ka Chun Ng, Takashi Orimoto, Jason Pittenger, Toshi Horie, Konstantinos Adam, Mosong Cheng, Ebo Croffie, Yunfei Deng, Frank Gennari, Thomas Pistor, Garth Robins, Mike Williamson, Bo Wu, Lei Yuan, Andrew Neureuther

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435691

KEYWORDS: Printing, Java, Photomasks, Diffusion, Near field, Computer simulations, Optical simulations, Lithography, Human-machine interfaces, Etching

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Proceedings Article | 14 September 2001 Paper

ArF imaging modeling by using resist simulation and pattern matching

Mosong Cheng, Andrew Neureuther

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435731

KEYWORDS: Scanning electron microscopy, Performance modeling, Lithography, Calibration, Photomasks, Distortion, Device simulation, Image processing, Computer simulations, Scanners

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Proceedings Article | 24 August 2001 Paper

Survey of chemically amplified resist models and simulator algorithms

Ebo Croffie, Lei Yuan, Mosong Cheng, Andrew Neureuther

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436823

KEYWORDS: Diffusion, Fused deposition modeling, Polymers, Finite element methods, Computer simulations, Chemically amplified resists, Systems modeling, Photoresist processing, Image acquisition, Image processing

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Proceedings Article | 24 August 2001 Paper

Three-dimensional post-exposure modeling and its applications

Lei Yuan, Mosong Cheng, Ebo Croffie, Andrew Neureuther

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436824

KEYWORDS: Diffusion, Finite element methods, 3D modeling, Computer simulations, Contamination, Photomasks, Chemically amplified resists, Deep ultraviolet, Semiconducting wafers, Photoresist processing

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Proceedings Article | 23 June 2000 Paper

Fast imaging algorithm for simulating pattern transfer in deep-UV resist and extracting postexposure bake parameters

Mosong Cheng, Ebo Croffie, Andrew Neureuther

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388372

KEYWORDS: Computer simulations, Fused deposition modeling, Diffusion, Deep ultraviolet, Calcium, Partial differential equations, Optical proximity correction, Finite difference methods, Chemically amplified resists, Computing systems

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Proceedings Article | 23 June 2000 Paper

Modeling chemically amplified resists for 193-nm lithography

Ebo Croffie, Mosong Cheng, Andrew Neureuther, Francis Houlihan, Raymond Cirelli, James Sweeney, Gary Dabbagh, Pat Watson, Omkaram Nalamasu, Ilya Rushkin, Ognian Dimov, Allen Gabor

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388300

KEYWORDS: Diffusion, Data modeling, FT-IR spectroscopy, Chemically amplified resists, Semiconducting wafers, Absorbance, Photolysis, Polymers, Lithography, Interfaces

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Proceedings Article | 11 June 1999 Paper

Methodology for modeling and simulating line-end shortening effects in deep-UV resist

Mosong Cheng, Ebo Croffie, Andrew Neureuther

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350275

KEYWORDS: Diffusion, Deep ultraviolet, Scanning electron microscopy, Photomasks, Data modeling, Calcium, Semiconducting wafers, Error analysis, Focus stacking software, Photoresist processing

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Proceedings Article | 11 June 1999 Paper

Efficient simulation of postexposure bake processes in STORM

Ebo Croffie, Mosong Cheng, Marco Zuniga, Andrew Neureuther

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350174

KEYWORDS: Diffusion, Computer simulations, Polymers, Numerical analysis, Finite element methods, Chemically amplified resists, Palladium, Image acquisition, Molecules, Photoresist processing

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Showing 5 of 20 publications

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