Dr. Mike P. C. Watts Profile

Dr. Mike P. C. Watts

President at Impattern Solutions

SPIE Involvement:

Author

Proceedings Article | 7 March 2014 Paper

Design strategy for low e windows with effective insulation

Mike P. Watts

Proceedings Volume 8981, 89811J (2014) https://doi.org/10.1117/12.2032966

KEYWORDS: Glasses, Climatology, Coating, Silver, Solar energy, Visible radiation, Mid-IR, Thermography, Krypton, Convection

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Proceedings Article | 26 March 2013 Paper

A process for low cost wire grid polarizers

M. P. Watts, M. Little, E. Egan, A. Hochbaum, C. Johns, S. Stephansen

Proceedings Volume 8680, 86802C (2013) https://doi.org/10.1117/12.2008924

KEYWORDS: Polarizers, Metals, Polarization, Monte Carlo methods, Lithography, Aluminum, LCDs, Deposition processes, Reflectivity, Etching

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Proceedings Article | 5 March 2013 Paper

Wire grid polarizers fabricated by low-angle deposition

M. P. Watts, M. Little, E. Egan, A. Hochbaum, C. Johns, S. Stephansen

Proceedings Volume 8613, 86130E (2013) https://doi.org/10.1117/12.2008812

KEYWORDS: Polarizers, Metals, Multilayers, Aluminum, Polarization, Reflectivity, LCDs, Monte Carlo methods, Etching, Lithography

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Proceedings Article | 9 September 2008 Paper

Strategies for low cost imprint molds

M. Watts

Proceedings Volume 7039, 70390A (2008) https://doi.org/10.1117/12.798222

KEYWORDS: Etching, Lithography, Photomasks, Semiconducting wafers, Interferometry, Manufacturing, Analog electronics, Nickel, Silicon, Optical lithography

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Proceedings Article | 26 February 2008 Paper

Advances in the fabrication of surface modified microfluidic devices in nonfluorescing UV cured materials

M. P. C. Watts, N. Cramer, R. Sebra, H. Simms, K. Masters, T. Haraldsson, K. Anseth, C. Bowman

Proceedings Volume 6882, 688203 (2008) https://doi.org/10.1117/12.758755

KEYWORDS: Ultraviolet radiation, Luminescence, Microfluidics, Polymerization, Liquids, Polymers, Multilayers, Absorption, Optical filters, Optics manufacturing

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Proceedings Article | 8 February 2008 Paper

Advances in roll to roll processing of optics

Michael P. C. Watts

Proceedings Volume 6883, 688305 (2008) https://doi.org/10.1117/12.762668

KEYWORDS: Holograms, Manufacturing, Solar cells, Multilayers, Organic light emitting diodes, Semiconductors, LCDs, Ultraviolet radiation, Thin films, Polymers

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Proceedings Article | 15 March 2007 Paper

Imprint solutions, costs, and returns of patterning LED’s

M. Watts

Proceedings Volume 6517, 65172E (2007) https://doi.org/10.1117/12.713494

KEYWORDS: Semiconducting wafers, Light emitting diodes, Image processing, Optical lithography, Etching, Manufacturing, Photonic crystals, Glass molding, Silicon, Electron beam lithography

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Proceedings Article | 7 March 2007 Paper

The value, solutions, and costs of patterning LEDs

Michael Watts, M. Zoorob, T. Lee, J. McKenzie

Proceedings Volume 6462, 64620N (2007) https://doi.org/10.1117/12.711475

KEYWORDS: Light emitting diodes, Semiconducting wafers, Photonic crystals, Optical lithography, Data modeling, Etching, Crystals, Gallium nitride, Waveguides, Glass molding

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The literature on high brightness LED's shows that patterning the top surface of LED's with photonic crystals is being used to create the most intense LED light sources. The best example is that you can now buy projection displays that are illuminated by LED's with Photonic Crystals. The experimental and model data, reviewed in this article, shows that patterning delivers value through improved beam shaping and light extraction using carefully optimized photonic crystals. The data also suggests that in the future, patterning in combination with sub micron device layers and strategically placed mirrors can produce extraction efficiencies of greater than 80%. In addition, patterning can improve current spreading and reduce epitaxy defects. The long term goal is to develop a LED that can be used with minimal additional packaging to focus the light or extract heat. The solution to low cost patterning for Photonic Crystals 100 nm features is to use imprint. The imprint patterning process is implemented in a module that consists of a clean and coat tool, an imprint tool and an etch tool. Cleaning is essential because imprint is a contact technology and particles will lead to process defects and mold damage. There are 2 companies that are developing production tools for LED applications; Molecular Imprints (MII) and Obducat. There are 2 companies that are supporting research tools, and expect to develop production systems in response to customer order, EV Group and Nanonex. The principal difference between imprint suppliers are the different strategies used to conform the mold to the substrate, and the state of system development. To date MII has published the most complete process performance data on an automated production tool. The cost of patterning is less than 0.5 cent per device. First the value of increased LED output will be described, followed by a discussion of the different patterning solutions for improving output, then the different solutions for creating the patterning will be described and finally the costs are estimated.

Proceedings Article | 23 January 2006 Paper

Fabrication of nano and micro optical elements by step and flash imprint lithography

Niyaz Khusnatdinov, Gary Doyle, Mike Miller, Nick Stacey, Mike Watts, Dwayne LaBrake

Proceedings Volume 6110, 61100K (2006) https://doi.org/10.1117/12.647301

KEYWORDS: Lenses, Etching, Lithography, Polarizers, Aluminum, Optical lithography, Optical components, Fabrication, Photoresist processing, Semiconducting wafers

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The Step and Flash Imprint Lithography (S-FIL^TM) process is a step and repeat nano-imprint lithography (NIL) technique based on UV curable low viscosity liquids.^1,2,3Investigation by this group and others has shown that the resolution of replication by imprint lithography is limited only by the size of the structures that can be created on the template (mold). S-FIL uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning. This approach allows for micro and nano-fabrication of devices with widely varying pattern densities and complicated structures. Wire grid polarizers and micro lenses are two examples for optical components that can be formed using SFIL technology. Step and Flash Imprint Lithography Reverse (S-FIL/R) tone has been used to form resist patterns for a number of different device types ^1,4,6. The authors have employed S-FIL/R and dry develop techniques to form resist patterns with 100 nm period useful for the fabrication of wire grid polarizers. S-FIL/R has a number of advantages over interference lithography techniques for the fabrication of sub 200 nm period grating structures including but no limited to pattern repeatability, vibration insensitivity, high aspect ratio feature formation, greater extendibility and high resolution. The authors have devised imprint and dry etching processes for resist and substrate patterning to form Al based wire grid polarizers with 100 nm pitch. The fabrication processes and resulting devises will be described. While S-FIL is useful for in the formation of resist patterned wafers, it is also capable of forming devices by functional material patterning. Polymer micro lenses are a good examples of functional material devices useful for a number of applications including CMOS and CCD cameras. The fact that lens geometry is defined by the template and requires no post imprint processing provides a strong advantage over current lens formation approaches. Recent results and the state of current micro lens fabrication by S-FIL is described.

Proceedings Article | 6 May 2005 Paper

Fabrication of nanometer sized features on non-flat substrates using a nano-imprint lithography process

Mike Miller, Gary Doyle, Nick Stacey, Frank Xu, S. Sreenivasan, Mike Watts, Dwayne LaBrake

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.607340

KEYWORDS: Semiconducting wafers, Etching, Lithography, Polishing, Nanoimprint lithography, Silicon, Photomicroscopy, Optical lithography, Scanning electron microscopy, Nanolithography

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Proceedings Article | 20 May 2004 Paper

Development of imprint materials for the Step and Flash Imprint Lithography process

Frank Xu, Nicholas Stacey, Mike Watts, Van Truskett, Ian McMackin, Jin Choi, Philip Schumaker, Ecron Thompson, Daniel Babbs, S. Sreenivasan, C. Grant Willson, Norman Schumaker

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538734

KEYWORDS: Lithography, Ultraviolet radiation, Silicon, Optical lithography, Liquids, Semiconducting wafers, Etching, Optical alignment, Scanning electron microscopy, Interfaces

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Proceedings Article | 20 May 2004 Paper

Step and Repeat UV nanoimprint lithography tools and processes

Ian McMackin, Jin Choi, Philip Schumaker, Van Nguyen, Frank Xu, Ecron Thompson, Daniel Babbs, S. Sreenivasan, Mike Watts, Norman Schumaker

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538733

KEYWORDS: Ultraviolet radiation, Lithography, Semiconducting wafers, Liquids, Process control, Optical lithography, Optical alignment, Etching, Nanoimprint lithography, Line edge roughness

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Proceedings Article | 16 June 2003 Paper

Design and performance of a step and repeat imprinting machine

Ian McMackin, Philip Schumaker, Daniel Babbs, Jin Choi, Wenli Collison, S. Sreenivasan, Norman Schumaker, Michael Watts, Ronald Voisin

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490133

KEYWORDS: Semiconducting wafers, Etching, Ultraviolet radiation, Lithography, Liquids, Optical alignment, Particles, Critical dimension metrology, Scanning electron microscopy, Optical lithography

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Proceedings Article | 1 June 1990 Paper

Novel method for the prediction of process sensitivity in photolithography

Michael Watts, Stephen Williams

Proceedings Volume 1261, (1990) https://doi.org/10.1117/12.20061

KEYWORDS: Semiconducting wafers, Thin film coatings, Process control, Inspection, Integrated circuits, Metrology, Humidity, Data modeling, Control systems, Photoresist processing

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