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Matthew Rednor
at TEL Technology Ctr America LLC
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Publications (2)
SPIE Journal Paper | 6 November 2024 Open Access
Superlattice effects and limitations of non-destructive measurement of advanced Si/Si1−xGex superlattice structures using Mueller matrix scatterometry and high-resolution X-ray diffraction
Ezra Pasikatan, George Antonelli, Nick Keller, Subhadeep Kal, Matthew Rednor, Kandabara Tapily, Dave Hetzer, Mark Schaefer, Markus Kuhn, Satoshi Murakami, Alain Diebold
JM3, Vol. 23, Issue 04, 044004, (November 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.044004
KEYWORDS: Silicon, Superlattices, Germanium, Etching, Film thickness, Nondestructive evaluation, Silicon nitride, Scanning transmission electron microscopy, Scatterometry, Data modeling
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Proceedings Article | 10 April 2024 Presentation + Paper
Superlattice effects and limitations of non-destructive measurement of advanced Si/Si(1-x)Ge(x) superlattice structures using Mueller matrix scatterometry (MMSE) and high-resolution x-ray diffraction (XRD)
Ezra Pasikatan, G. Andrew Antonelli, Nicholas Keller, Subhadeep Kal, Matthew Rednor, Markus Kuhn, Satoshi Murakami, Alain Diebold
Proceedings Volume 12955, 129550K (2024) https://doi.org/10.1117/12.3010523
KEYWORDS: Etching, Silicon, Superlattices, Scatterometry, Film thickness, Germanium, Scanning transmission electron microscopy, Mueller matrices, X-ray diffraction, Metrology
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