Dr. Matthew G. Lassiter Profile

Dr. Matthew G. Lassiter

Research Engineer at Photronics Inc

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 21 March 2006 Paper

High transmission mask technology for 45nm node imaging

Will Conley, Nicoló Morgana, Bryan Kasprowicz, Mike Cangemi, Matt Lassiter, Lloyd Litt, Marc Cangemi, Rand Cottle, Wei Wu, Jonathan Cobb, Young-Mog Ham, Kevin Lucas, Bernie Roman, Chris Progler

Proceedings Volume 6154, 615411 (2006) https://doi.org/10.1117/12.659353

KEYWORDS: Photomasks, Polarization, Etching, Plasma etching, Manufacturing, Plasma, Semiconducting wafers, Chromium, Lithography, Chlorine

Read Abstract +

Proceedings Article | 15 March 2006 Paper

High transmission mask technology for 45nm node imaging

Will Conley, Nicoló Morgana, Bryan Kasprowicz, Mike Cangemi, Matt Lassiter, Lloyd Litt, Marc Cangemi, Rand Cottle, Wei Wu, Jonathan Cobb, Young-Mog Ham, Kevin Lucas, Bernie Roman, Chris Progler

Proceedings Volume 6154, 61541D (2006) https://doi.org/10.1117/12.659390

KEYWORDS: Photomasks, Polarization, Etching, Plasma etching, Manufacturing, Plasma, Semiconducting wafers, Chromium, Lithography, Chlorine

Read Abstract +

Proceedings Article | 9 November 2005 Paper

A films based approach to intensity imbalance correction for 65nm node c:PSM

Rand Cottle, Pierre Sixt, Matt Lassiter, Marc Cangemi, Patrick Martin, Chris Progler

Proceedings Volume 5992, 59920J (2005) https://doi.org/10.1117/12.632214

KEYWORDS: Etching, Photomasks, Reticles, Manufacturing, Wet etching, Silica, Lithography, Resolution enhancement technologies, Scattering, Chromium

Read Abstract +

Proceedings Article | 12 May 2005 Paper

High transmission mask technology for 45nm node imaging

Will Conley, Mike Cangemi, Bryan Kasprowicz, Matt Lassiter, Lloyd Litt, Marc Cangemi, Rand Cottle, Mark Smith, Wei Wu, Jonathan Cobb, Rusty Carter, Young-mog Ham, Kevin Lucas, Bernie Roman, Chris Progler

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601584

KEYWORDS: Photomasks, Image processing, Manufacturing, Image transmission, Lithography, Photoresist materials, Nanoimprint lithography, Image resolution, Semiconductors, 193nm lithography

Read Abstract +

Proceedings Article | 6 December 2004 Paper

AAPSM repair utilizing transparent etch stop layer

Darren Taylor, Michael Cangemi, Matthew Lassiter, Marc Cangemi, Eric Poortinga

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.566596

KEYWORDS: Etching, Quartz, Photomasks, Manufacturing, Inspection, Phase shifts, Lithography, Software development, Binary data, Scanning electron microscopy

Read Abstract +

Proceedings Article | 2 June 2004 Paper

Implementation of a transparent etch stop layer for an improved alternating PSM

Michael Cangemi, Darren Taylor, Matthew Lassiter

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568018

KEYWORDS: Etching, Quartz, Manufacturing, Phase shifts, Silica, Photomasks, Standards development, Resolution enhancement technologies, Optics manufacturing, Fluorine

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Gray assist bar OPC

Neal Lafferty, Geert Vandenberghe, Bruce Smith, Matthew Lassiter, Patrick Martin

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544244

KEYWORDS: Diffraction, Optical proximity correction, Reticles, Neodymium, Opacity, Diffraction gratings, Binary data, Manufacturing, SRAF, Lithography

Read Abstract +

Proceedings Article | 17 December 2003 Paper

193-nm EAPSM inspection comparison: commercial versus alternative absorber material

Darren Taylor, Matthew Lassiter, Michael Cangemi

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518069

KEYWORDS: Inspection, Phase shifts, Photomasks, Manufacturing, Optical properties, Semiconducting wafers, Reticles, Inspection equipment, Etching, Lithography

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Improved phase uniformity control using a new AAPSM etch stop layer technique

Matthew Lassiter, Michael Cangemi, Darren Taylor

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518130

KEYWORDS: Etching, Silica, Phase shifts, Quartz, Photomasks, Refraction, Fluorine, Chemistry, Glasses, Aluminum

Read Abstract +

Proceedings Article | 1 August 2002 Paper

Metrology methods comparison for 2D structures on binary and embedded attenuated phase-shift masks

Matthew Lassiter, Benjamin Eynon

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476969

KEYWORDS: Photomasks, Phase shifts, Inspection, Binary data, Calibration, Semiconducting wafers, Objectives, CCD cameras, Integration, Silica

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Inspection of chromeless AAPSM

Darren Taylor, Matthew Lassiter, Benjamin Eynon, Douglas Van Den Broeke, J. Fung Chen

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474513

KEYWORDS: Photomasks, Inspection, Phase shifts, Quartz, Manufacturing, Lithography, Silica, Semiconducting wafers, Optical lithography, Defect detection

Read Abstract +