Masakazu Tokita
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 25 May 2010 Paper
Proceedings Volume 7748, 77481G (2010) https://doi.org/10.1117/12.864415
KEYWORDS: Photomasks, Inspection, Defect detection, Semiconducting wafers, Data conversion, Image sensors, Databases, Image transmission, Source mask optimization

Proceedings Article | 16 April 2010 Paper
Proceedings Volume 7638, 763833 (2010) https://doi.org/10.1117/12.846412
KEYWORDS: Inspection, Photomasks, Defect detection, Databases, Data conversion, Computer simulations, Semiconductors, Source mask optimization, Defect inspection, Optical proximity correction

Proceedings Article | 23 September 2009 Paper
George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Yasuko Saito, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji
Proceedings Volume 7488, 74880A (2009) https://doi.org/10.1117/12.831475
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Lithography, Scanners, Sensors, Image resolution, Optical inspection, Wafer-level optics, Printing

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 74880B (2009) https://doi.org/10.1117/12.829739
KEYWORDS: Inspection, Photomasks, Lithography, Defect detection, Image transmission, Semiconducting wafers, SRAF, Optical inspection, Telecommunications, Sensors

Proceedings Article | 11 May 2009 Paper
George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji
Proceedings Volume 7379, 73791B (2009) https://doi.org/10.1117/12.824288
KEYWORDS: Photomasks, Inspection, Lithography, Semiconducting wafers, Scanners, Sensors, Defect detection, Optical inspection, Wafer-level optics, Image resolution

Proceedings Article | 11 May 2009 Paper
Masakazu Tokita, Hideo Tsuchiya, Takafumi Inoue, Tadao Inoue, Masaki Yamabe
Proceedings Volume 7379, 73792A (2009) https://doi.org/10.1117/12.824324
KEYWORDS: Inspection, Photomasks, Image processing, Defect detection, Data processing, Semiconducting wafers, Image sensors, Analytical research, Interfaces, Defect inspection

Proceedings Article | 17 October 2008 Paper
Masaki Yamabe, Tadao Inoue, Masahiro Shoji, Hiroshi Yasuda, Hiromichi Hoshi, Masakazu Tokita
Proceedings Volume 7122, 712220 (2008) https://doi.org/10.1117/12.802966
KEYWORDS: Photomasks, Inspection, Manufacturing, Data conversion, Parallel processing, Diagnostics, System integration, Metals, Design for manufacturing, Semiconducting wafers

Proceedings Article | 19 May 2008 Paper
Hideo Tsuchiya, Masakazu Tokita, Takehiko Nomura, Tadao Inoue
Proceedings Volume 7028, 70282I (2008) https://doi.org/10.1117/12.793088
KEYWORDS: Inspection, Photomasks, Defect detection, Data conversion, Algorithm development, Databases, Optical proximity correction, Multilayers, Analytical research, Semiconductors

Showing 5 of 8 publications
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