Mr. Lin-Chin Su Profile

Lin-Chin Su

at Nanya Technology Corp

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Publications (1)

Proceedings Article | 10 April 2024 Presentation + Paper

Evaluating the probabilistic process window for use in high volume manufacturing

Tsu-Wen Huang, Ken-Huan Ho, Cheng-Wei Yang, Yao-Hsiung Kung, Lin-Chin Su, Chris Mack

Proceedings Volume 12955, 129551A (2024) https://doi.org/10.1117/12.3011706

KEYWORDS: Line width roughness, Metrology, Critical dimension metrology, Stochastic processes, Semiconducting wafers, Defect inspection, Measurement uncertainty, Calibration, High volume manufacturing

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