Mr. Lilach Tamam Profile

Lilach Tamam

at Nova Ltd

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Publications (2)

Proceedings Article | 27 April 2023 Presentation + Paper

Full wafer OCD metrology: increasing sampling rate without the cost of ownership penalty

Daniel Doutt, Ping-ju Chen, Bhargava Ravoori, Tuyen Tran, Eitan Rothstein, Nir Kampel, Lilach Tamam, Effi Aboody, Avron Ger, Harindra Vedala

Proceedings Volume 12496, 124960B (2023) https://doi.org/10.1117/12.2657471

KEYWORDS: Semiconducting wafers, Etching, Education and training, Chemical mechanical planarization, Metrology, Machine learning, Data modeling, Process control, Time metrology, Visibility

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Proceedings Article | 28 March 2017 Presentation + Paper

Complex metrology on 3D structures using multi-channel OCD

Taher Kagalwala, Sridhar Mahendrakar, Alok Vaid, Paul Isbester, Aron Cepler, Charles Kang, Naren Yellai, Matthew Sendelbach, Mihael Ko, Ovadia Ilgayev, Yinon Katz, Lilach Tamam, Ilya Osherov

Proceedings Volume 10145, 101451C (2017) https://doi.org/10.1117/12.2261419

KEYWORDS: 3D metrology, Metrology, Thin films, Process control, Scatterometry, Thin film devices, Semiconducting wafers, Photomasks, Chemical species, Dielectrics, Transmission electron microscopy, Diffractive optical elements, Solids, Channel projecting optics, Etching

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