Dr. Kiyomi Koyama Profile

Dr. Kiyomi Koyama

Senior Manager at Nihon Synopsys GK

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Author

Publications (3)

Proceedings Article | 25 August 1999 Paper

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa, Shuichi Tamamushi, Yoshiaki Hattori, Souji Koikari, Hideo Kusakabe, Takayuki Abe, Munehiro Ogasawara, Kiminobu Akeno, Hirohito Anze, Kiyoshi Hattori, Ryoichi Hirano, Shusuke Yoshitake, Tomohiro Iijima, Kenji Ohtoshi, Kazuto Matsuki, Naoharu Shimomura, Noboru Yamada, Hitoshi Higurashi, Noriaki Nakayamada, Yuuji Fukudome, Shigehiro Hara, Eiji Murakami, Takashi Kamikubo, Yasuo Suzuki, Susumu Oogi, Mitsuko Shimizu, Shinsuke Nishimura, Hideyuki Tsurumaki, Satoshi Yasuda, Kenji Ooki, Kiyomi Koyama, Susumu Watanabe, Mitsuhiro Yano, Hiroaki Suzuki, Hiroshi Hoshino, Masaki Toriumi, Osamu Watanabe, Kazuo Tsuji, Mitsunobu Katayama, Seiichi Tsuchiya, Kimio Suzuki, Shiro Kurasawa, Kazuyuki Okuzono, Hirokazu Yamada, Koji Handa, Yoshio Suzuki, Tetsu Akiyama, Yoshiaki Tada, Akira Noma, Tadahiro Takigawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360219

KEYWORDS: Photomasks, Data conversion, Mask making, Lithography, Distortion, Electron beams, Manufacturing, Critical dimension metrology, Vibration control, Sensors

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Proceedings Article | 24 July 1996 Paper

Pattern-data preparation method to enchance high-throughput mask fabrication in variable-shaped e-beam writing system

Shigehiro Hara, Eiji Murakami, Shunko Magoshi, Kiyomi Koyama, Hirohito Anze, Yoji Ogawa, A. Kabeya, S. Ooki, Tamaki Saito, T. Fujii, S. Sakamoto, Hiromi Suzuki, Mitsuhiro Yano, Sadakazu Watanabe

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245217

KEYWORDS: Data conversion, Computer aided design, Metals, Data processing, Mask making, Boron, Microelectronics, Solids, Chlorine, Algorithm development

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Proceedings Article | 3 July 1995 Paper

Advanced mask fabrication system

Tadahiro Takigawa, Toru Tojo, Yoji Ogawa, Kiyomi Koyama, Akira Ono, Soichi Inoue, Shinichi Ito, Mineo Goto

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212798

KEYWORDS: Photomasks, Data conversion, Mask making, Inspection, Critical dimension metrology, Optical lithography, Deep ultraviolet, Optical resolution, Optical proximity correction, Transmittance

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