Dr. Junichi Onodera Profile

Dr. Junichi Onodera

General Manager at Tokyo Ohka Kogyo Co Ltd

SPIE Involvement:

Author

Proceedings Article | 30 March 2010 Paper

Negative-tone chemically amplified molecular resist based on novel fullerene derivative for nanolithography

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Tomoyuki Ando, Katsumi Ohmori, Mitsuru Sato, Junichi Onodera

Proceedings Volume 7639, 76390U (2010) https://doi.org/10.1117/12.846391

KEYWORDS: Fullerenes, Etching, Nanolithography, Electron beams, Lithography, Polymers, Reactive ion etching, Ultraviolet radiation, Line edge roughness, Silicon

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Proceedings Article | 1 April 2009 Paper

A study of the photo acid generator material design for chemically amplified photoresists

Y. Utsumi, T. Seshimo, Y. Komuro, A. Kawaue, K. Ishiduka, K. Matsuzawa, Hideo Hada, J. Onodera

Proceedings Volume 7273, 72732F (2009) https://doi.org/10.1117/12.815190

KEYWORDS: Diffusion, Lithography, Polymers, Semiconducting wafers, Molecular interactions, Photoresist materials, Sensors, Hydrogen, Silicon, Chemically amplified resists

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Proceedings Article | 1 April 2009 Paper

Decomposition analysis of molecular resists to further CD control

Daiju Shiono, Hideo Hada, Taku Hirayama, Junichi Onodera, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 7273, 727330 (2009) https://doi.org/10.1117/12.815173

KEYWORDS: Surface roughness, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Coating, Molecules, Chemical analysis, Atomic force microscopy, Light sources, Spectroscopy

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Proceedings Article | 1 April 2009 Paper

Dissolution kinetics and deprotection reaction in chemically amplified resists upon exposure to extreme ultraviolet radiation

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Takeyoshi Mimura, Takeshi Iwai, Junichi Onodera

Proceedings Volume 7273, 72731X (2009) https://doi.org/10.1117/12.814066

KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Absorption, Chemically amplified resists, Absorbance, Image processing, Silicon, Ultraviolet radiation, Line width roughness

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Proceedings Article | 26 March 2008 Paper

Chemically amplified molecular resist based on fullerene derivative for nanolithography

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Tomoyuki Ando, Katsumi Ohmori, Mitsuru Sato, Junichi Onodera

Proceedings Volume 6923, 69230N (2008) https://doi.org/10.1117/12.771835

KEYWORDS: Fullerenes, Etching, Electron beams, Silicon, Nanolithography, Ultraviolet radiation, Photoresist processing, Line edge roughness, Polymers, Scanning electron microscopy

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Proceedings Article | 22 March 2007 Paper

Material design of negative-tone polyphenol resist for EUV and EB lithography

Kyoko Kojima, Shigeki Mori, Daiju Shiono, Hideo Hada, Junichi Onodera

Proceedings Volume 6519, 65191D (2007) https://doi.org/10.1117/12.711759

KEYWORDS: Lithography, Extreme ultraviolet lithography, Line edge roughness, Extreme ultraviolet, Semiconductors, Molybdenum, Polymers, Inspection, Chromatography, Molecules

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Proceedings Article | 29 March 2006 Paper

Molecular resists based on cholate derivatives for electron-beam lithography

Daiju Shiono, Taku Hirayama, Hideo Hada, Junichi Onodera, Tadashi Arai, Atsuko Yamaguchi, Kyoko Kojima, Hiroshi Shiraishi, Hiroshi Fukuda

Proceedings Volume 6153, 61532D (2006) https://doi.org/10.1117/12.656949

KEYWORDS: Lithography, Etching, Silicon, Silicon films, Semiconducting wafers, FT-IR spectroscopy, Line edge roughness, Absorbance, Glasses, Argon

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Proceedings Article | 29 March 2006 Paper

Negative-tone polyphenol resist based on chemically amplified polarity change reaction with sub-50-nm resolution capability

Kyoko Kojima, Takashi Hattori, Hiroshi Fukuda, Taku Hirayama, Daiju Shiono, Hideo Hada, Junichi Onodera

Proceedings Volume 6153, 61530G (2006) https://doi.org/10.1117/12.656112

KEYWORDS: Line edge roughness, Lithography, Scanning electron microscopy, Etching, FT-IR spectroscopy, Potassium, Silicon, Extreme ultraviolet lithography, Inspection, Polymers

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Proceedings Article | 4 May 2005 Paper

Development of electron beam resists based on amorphous polyphenols with low molecular weight and narrow dispersion

Taku Hirayama, Daiju Shiono, Shogo Matsumaru, Toshiyuki Ogata, Hideo Hada, Junichi Onodera, Tadashi Arai, Toshio Sakamizu, Atsuko Yamaguchi, Hiroshi Shiraishi, Hiroshi Fukuda, Mitsuru Ueda

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600416

KEYWORDS: Line edge roughness, Ions, Scanning electron microscopy, Lithography, Etching, Polymers, Electron beams, Silicon, Semiconducting wafers, Inspection

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Showing 5 of 9 publications

Conference Committee Involvement (3)

SPIE Lithography Asia - Korea

13 October 2010 | n/a, Republic of Korea

SPIE Lithography Asia - Taiwan

18 November 2009 | Taipei, Taiwan

SPIE Lithography Asia - Taiwan

4 November 2008 | Taipei, Taiwan

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