Mr. Jung Hwan Kim Profile

Jung Hwan Kim

Material Science Engineer at Hanyang Univ

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Author

Publications (6)

Proceedings Article | 13 June 2022 Poster

Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle

Chang Soo Kim, Jung Hwan Kim, Seong Ju Wi, Ha Neul Kim, Young Woo Kang, Won Jin Kim, Jinho Ahn

Proceedings Volume 12051, 120510S (2022) https://doi.org/10.1117/12.2614355

KEYWORDS: Pellicles, Extreme ultraviolet, Numerical analysis, Finite element methods, Computer simulations

SPIE Journal Paper | 1 February 2022 Open Access

Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle

Junghwan Kim, Haneul Kim, Jinho Ahn

JM3, Vol. 21, Issue 01, 014401, (February 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.014401

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Finite element methods, Silicon, Refractive index, Heat flux, Signal attenuation, Optical lithography, Numerical analysis

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SPIE Journal Paper | 25 May 2021

Impact of residual stress on the deflection of extreme ultraviolet pellicles

Junghwan Kim, Haneul Kim, Jinho Ahn

JM3, Vol. 20, Issue 02, 024401, (May 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.024401

KEYWORDS: Pellicles, Extreme ultraviolet, Finite element methods, Silicon, Extreme ultraviolet lithography, Structural analysis, Scanners, Protactinium, Image processing, Transmittance

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Proceedings Article | 16 October 2017 Presentation

Evaluating mechanical characteristic of SiNx EUV pellicle membrane (Conference Presentation)

Yong Ju Jang, Jung Hwan Kim, Jin-ho Ahn

Proceedings Volume 10450, 104500T (2017) https://doi.org/10.1117/12.2281683

KEYWORDS: Silicon, Pellicles, Extreme ultraviolet, Semiconductor lasers, Sensors, Mask cleaning

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Proceedings Article | 18 March 2016 Paper

Stress-induced pellicle analysis for extreme-ultraviolet lithography

Eun-Sang Park, Min-Ha Kim, Sollee Hwang, Jung Hwan Kim, Hye-Keun Oh

Proceedings Volume 9776, 977626 (2016) https://doi.org/10.1117/12.2218219

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Lithography, Silicon, Finite element methods, Image quality, High volume manufacturing, Safety

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Proceedings Article | 13 March 2015 Paper

Evaluation of optical properties of EUV resist underlayer

Jung Sik Kim, Seongchul Hong, Jae Uk Lee, Seung Min Lee, Jung Hwan Kim, Hyun Min Song, Jinho Ahn

Proceedings Volume 9422, 94222E (2015) https://doi.org/10.1117/12.2085755

KEYWORDS: Refractive index, Photons, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Stochastic processes, Line edge roughness, Optical properties, Lithography

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Showing 5 of 6 publications

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