Mr. Jonggul Doh Profile

Jonggul Doh

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 26 August 2024 Paper

EUV mask inspection technologies with actinic tool for DRAM and logic lithography

Cheolki Min, Daeho Sung, Jeongmin Kim, Hongcheol Kim, Sobin Ji, Hakseung Han, Jonggul Doh, Inyong Kang, Jin Choi, Sanghee Lee, Satoru Doi, Toshiyuki Todoroki, Hiroki Miyai, Jaehee Han, Youngsub Jang

Proceedings Volume 13177, 131770P (2024) https://doi.org/10.1117/12.3031837

KEYWORDS: Inspection, Extreme ultraviolet, Deep ultraviolet, Pellicles, Optical proximity correction, Logic, SRAF, Lithography, Image resolution, Defect inspection

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Proceedings Article | 26 September 2019 Paper

Requirements of data technology for EUV photomask

Jin Choi, Jonggul Doh, Minah Kim, Chan Uk Jeon

Proceedings Volume 11148, 111480F (2019) https://doi.org/10.1117/12.2538411

KEYWORDS: Photomasks, Extreme ultraviolet, Data corrections, Extreme ultraviolet lithography, Optical lithography, Lithography, Modulation, Data processing, Ecosystems

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Proceedings Article | 1 April 2013 Paper

Stochastic resist patterning simulation using attenuated PSM for EUV lithography

Seongchul Hong, Seejun Jeong, Jae Uk Lee, Seung Min Lee, Jongseok Kim, Jonggul Doh, Jinho Ahn

Proceedings Volume 8679, 867928 (2013) https://doi.org/10.1117/12.2011362

KEYWORDS: Optical lithography, Photomasks, Extreme ultraviolet lithography, Phase shifts, Line edge roughness, Line width roughness, Extreme ultraviolet, Stochastic processes, Critical dimension metrology, Molybdenum

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Proceedings Article | 8 November 2012 Paper

Study for compensation of unexpected image placement error caused by VSB mask writer deflector

Hyun-joo Lee, Min-kyu Choi, Seong-yong Moon, Han-Ku Cho, Jonggul Doh, Jinho Ahn

Proceedings Volume 8522, 852228 (2012) https://doi.org/10.1117/12.964098

KEYWORDS: Vestigial sideband modulation, Photomasks, Associative arrays, Contamination, Electron beams, Beam shaping, Reliability, Calibration, Data modeling, Semiconductors

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Proceedings Article | 23 March 2012 Paper

Printability and inspectability of defects on EUV blank for 2xnm hp HVM application

Sungmin Huh, In-Yong Kang, Chang Young Jeong, Jihoon Na, Dong Ryul Lee, Hwan-seok Seo, Seong-Sue Kim, Chan-Uk Jeon, Jonggul Doh, Gregg Inderhees, Jinho Ahn

Proceedings Volume 8322, 83220K (2012) https://doi.org/10.1117/12.916021

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Bismuth, Defect inspection, High volume manufacturing, Defect detection, Semiconductors

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Proceedings Article | 14 May 2007 Paper

Study of mask structure for 45-nm node based on manufacturability and lithographic performance

Jong Gul Doh, Cheol Hong Park, Yong Seung Moon, Bo Hye Kim, Sung Won Kwon, Sun Young Choi, Sung Hyuck Kim, Seong Yoon Kim, Byung Gook Kim, Sang Gyun Woo, Han Ku Cho

Proceedings Volume 6607, 66071U (2007) https://doi.org/10.1117/12.728977

KEYWORDS: Photomasks, Binary data, Chromium, Etching, Absorbance, Lithography, Manufacturing, Semiconducting wafers, Optical simulations, Electron beam lithography

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Proceedings Article | 20 October 2006 Paper

Study of the beam blur and its effect on the future mask fabrication

Sanghee Lee, Sungho Park, Mihye Ahn, Jonggul Doh, Sungyoon Kim, Byunggook Kim, Seongwoon Choi, Woosung Han

Proceedings Volume 6349, 63490X (2006) https://doi.org/10.1117/12.686472

KEYWORDS: SRAF, Scattering, Electron beams, Mask making, Photomasks, Laser scattering, Critical dimension metrology, Monte Carlo methods, Electron beam lithography, Diffusion

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Proceedings Article | 20 October 2006 Paper

Required mask specification for mass production devices below 65-nm design node

Dongseok Nam, Soohan Choi, Jonggul Doh, Young-hwa Noh, Hojune Lee, Yu-jeung Sin, Bo-hye Kim, Man-kyu Kang, Byunggook Kim, Seong-woon Choi, Woosung Han

Proceedings Volume 6349, 634928 (2006) https://doi.org/10.1117/12.686534

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Tolerancing, Photoresist processing, Optical proximity correction, Mask making, Semiconductors, Manufacturing, Computer simulations

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Proceedings Article | 20 October 2006 Paper

Feasibility study of mask fabrication in double exposure technology

Jong Gul Doh, Sang Hee Lee, Je Bum Yoon, Doo Youl Lee, Seong Yong Cho, Byung Gook Kim, Seong Woon Choi, Woo Sung Han

Proceedings Volume 6349, 63491U (2006) https://doi.org/10.1117/12.686523

KEYWORDS: Photomasks, Overlay metrology, Semiconducting wafers, Image registration, Thermal effects, Mask making, Reticles, Error analysis, Scanners, Chromium

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Showing 5 of 9 publications

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